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The Potential of Infrared Video Thermography for Control of Arc-Plasma Spray Fabrications

Published online by Cambridge University Press:  25 February 2011

D. Harris  and
M. Kelly
D. Harris
Affiliation:
APS-Materials Inc., 153 Walbrook, Dayton, OH 45405
M. Kelly
Affiliation:
DOE-Mound, Mound Ave, Miamisburg, Ohio, 45342
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Abstract

Infrared video thermography was used to evaluate the plasma plume and particle streams created by dc plasma jets operating in air and spraying several types of materials. The temperatures of the plasma plume were measured with the aid of a graphite ‘witness.’ By using the thermography system in an 8khz line scan mode, we were able to obtain data relative to the average velocity of particle groups injected into the plasma. The effects of process parameters could be observed in real time using these methods, showing the potential for real time process control.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 98: Symposium K – Plasma Processing and Synthesis of Materials II , 1987 , 141
Copyright
Copyright © Materials Research Society 1987

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References

REFERENCES

1. Harris, D., Janoweicki, R., Rosenbaum, F., Final Report, Contract F33615-72-C–1034. AFAQL-TR-73-250, Aug. (1973)Google Scholar
2. Dembovsky, V., Plasma Metallurgy; The Principles, Material Science Monographs, 23, Elsevier, (1985)Google Scholar
3. Cobine, J.D., Burger, E. F., J. App. Phys., 26/7, 895 (1955)Google Scholar
4. Sumerville, J. M., The Electric Arc. Wiley and Sons, London (1959)Google Scholar
5. Hirsch, M. N., Oskam, J. H., Gaseous Electronics, Vol.1, Academic Press (1978)Google Scholar
6. Pfender, E., Fundamentals and Applications of Plasma Chemistry, Center of Plasma Chemistry, Univ. Minn (1981)Google Scholar
7. Grien, H. R., Plasma Spectroscopy, McGraw-Hill, NY (1964)Google Scholar
8. Apelian, D., Kear, B., Plasma Deposition Processing, Report to Nat. Sci. Foundation Materials Advisory Committee (1983)Google Scholar