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Properties of DX Centers in AlxGa1−xAs and Effects on Heterojunction Devices

Published online by Cambridge University Press:  16 February 2011

P. M. Mooney*
Affiliation:
IBM Research Division, T.J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598 USA
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Abstract

In this paper the effects of DX levels on the properties of AlxGa1−xAs and certain heterojunction device structures are summarized. Studies of alloy effects, variations of the local atomic environment near the donor, are reviewed and microscopic models of the DX center are discussed in terms of these and other recent experimental results.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1. Craford, M.G., Stillman, G.E., Rossi, I.A., and Holonyak, N. Jr., Phys. Rev. 168, 867 (1968).10.1103/PhysRev.168.867Google Scholar
2. Mooney, P.M., J. AppI. Phys. 67. R1 (1990), and references therein.10.1063/1.345628Google Scholar
3. Lang, D. V., and Logan, R.A., Phys. Rev. Lett. 39, 635 (1977); D.V.Lang, R.A. Logan, and M. Jaros Phys. Rev. B 19, 1015 (1979).10.1103/PhysRevLett.39.635Google Scholar
4. Kuech, T.E., Vuehoff, E, and Meyerson, B.S., J. Cryst. Growth 68, 48 (1984).10.1016/0022-0248(84)90396-8Google Scholar
5. Vcuhoff, E., Baumeister, H., and Treicher, R., J. Cryst. Growth 93, 650 (1988).10.1016/0022-0248(88)90598-2Google Scholar
6. Veuhoff, F., Kuech, T.F., and Meyerson, B.S., J. FIcctrochem. Soc.: Solid-State Science and Technology 132, 1958 (1985).10.1149/1.2114261Google Scholar
7. Chand, N., Henderson, T., Clem, J., Masselink, W.T., Fischer, R., Chang, Y.C., and Morkoç, H., Phys. Rev. B 30, 4481 (1984).10.1103/PhysRevB.30.4481Google Scholar
8. Mooney, P. M., Caswell, N.S. and Wright, S. I., J. Appl. Phys.Google Scholar
9. Watanabe, M.O., Ahizawa, Y., Sugiyama, N., and Nakanisi, T., Inst. of Phys. Conf. Ser. 83, 105 (1987).Google Scholar
10. Brunthaler, G., Ploog, K., and Jantsch, W., Phys. Rev. Lett. 63, 2276 (1989).10.1103/PhysRevLett.63.2276Google Scholar
11. Craven, R.A. and Finn, D., J. Appl. Phys. 50, 6334 (1979)10.1063/1.325775Google Scholar
12. Calleja, E., Muñioz, E., Jimenez, B., Gomez, A., and Garcia, F., J. Appl. Phys. 57, 5295 (1985).10.1063/1.335484Google Scholar
13. Theis, T.N., Parker, B.D., Solomon, P.M., and Wright, S.L., Appl. Phys. Lett. 49, 1542 (1986).10.1063/1.97276Google Scholar
14. Engström, O. and Anders, A., J. Appl. Phys. 54, 5240 (1983).10.1063/1.332751Google Scholar
15. Lang, D. V. and Logan, R.A., Inst. Phys. Conf. Ser. 43 433 (1979).Google Scholar
16. Lang, D. V., in Deep Centers in Semiconductors, edited by Pantelides, S.T. (Gordon and Breach, New York, 1986) p. 489.Google Scholar
17. Mizuta, M., Tachikawa, M., Kukimoto, H., and Minomura, S., Japn. J. Appl. Phys. 24, L143 (1985).10.1143/JJAP.24.L143Google Scholar
18. Theis, T.N., Mooney, P.M. and Wright, S.L., Phys. Rev. Lett. 60, 361 (1988).10.1103/PhysRevLett.60.361Google Scholar
19. Murray, R., Neuman, R.C., Nandra, P.S., Beall, R.B., Harris, J.J., and Wright, P.J.. in Defects in Electronic Materials, Mat. Res. Soc. Proc. 104, 543 (1988).10.1557/PROC-104-543Google Scholar
20. Kumagai, O., Kawai, H., Mori, Y., and Kaneko, K., Appl. Phys. Lett. 45, 1322 (1984).10.1063/1.95135Google Scholar
21. Fujisawa, T., Yoshino, J., and Kukimoto, H., J. Crystal Growth 98 243 (1989).10.1016/0022-0248(89)90204-2Google Scholar
22. Chadi, D.J. and Chang, K.J., Phys. Rev Lett. 61, 873 (1988), and Phys. Rev. B 39, 10366 (1989).10.1103/PhysRevLett.61.873Google Scholar
23. Morgan, T.N., Budapest Conf. and T.N. Morgan, J. Electron. Mater. (in press).Google Scholar
24. Mooney, P.M., Theis, T.N., and Wright, S.L., Appl. Phys. Lett. 53, 2546 (1989), and P.M. Mooney, J. Electron. Mater. (in press).10.1063/1.100203Google Scholar
25. Calleja, F., Mooney, P.M., Theis, T.N., and Wright, S. L., Appl. Phys. Lett. (in press).Google Scholar
26. Calleja, R., Garcia, F., Gomez, A, Muñoz, F., Mooney, P.M., Morgan, T.N., and Wright, S.L., Appl. Phys. Lett. 56, 934 (1990).10.1063/1.102630Google Scholar
27. Baba, T., Mizuta, M., Fujisawa, T., Yoshino, J., and Kukimoto, H., Japn. J. Appl. Phys. 28, L891 (1989).10.1143/JJAP.28.L891Google Scholar
28. Baba, T., Mizuta, M., Fujisawa, I., Yoshino, J., and Kukimoto, H., in Impurities in Semiconductors, Proceedings of the MRS Fall Meeting, Boston, 1989 (in press).Google Scholar
29. Henning, J.C.M. and Ansems, J.P.M., Semicond. Sci. Technol. 2, 1 (1987).10.1088/0268-1242/2/1/001Google Scholar
30. Bourgoin, J.C. and Mauger, A., Appl. Phys. Lett. 53, 749 (1988).10.1063/1.99821Google Scholar
31. Pann, L.S., Tischler, M.A., Mooney, P.M., and Neumark, G.F., unpublished.Google Scholar
32. Bhattacharya, P.K., Majerfeld, A., and Saxena, A.K., Inst. Phys. Conf. Ser. 45, 199 (1979).Google Scholar
33. Fujisawa, T., Yoshino, J., and Kukimoto, H., Japn..J. Appl. Phys. (in press).Google Scholar
34. Mooney, P. M., Wilkening, W., Kaufmann, U., and Kuech, T.F., Phys. Rev. B 39, 5554 (1989).10.1103/PhysRevB.39.5554Google Scholar
35. Kachaturyan, K.A., Awschalom, D.D., Rozen, J.R., and Weber, E.R., Phys. Rev. Lett. 63, 1311 (1989).10.1103/PhysRevLett.63.1311Google Scholar
36. Mooney, P.M., Solomon, P.M., and Theis, T.N., Inst. Phys. Conf. Ser. 74, 617 (1985).Google Scholar
37. Nathan, M.I., Mooney, P.M., Solomon, P.M., and Wright, S.L., Appl. Phys. Lett. 47, 628 (1985).10.1063/1.96095Google Scholar
38. Kastalsky, A. and Kiehl, R. A., IEEE Trans. Electron Devices ED–33, 414 (1986).10.1109/T-ED.1986.22503Google Scholar
39. Baba, T., Ogawa, M., and Mizytani, T., Surface Science 174m 408 (1986).10.1016/0039-6028(86)90444-9Google Scholar
40. Petroff, P.M., Lang, D.V., Logan, R.A., and Johnson, D.W., Inst. Phys. Conf. Ser. 83, 105 (1987).Google Scholar