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Silicon Surface Metal Contamination Measurements using Grazing-Emission XRF Spectrometry

  • S. De Gendt (a1), K. Kenis (a1), M. Baeyens (a1), P. W. Mertens (a1), M. M. Heyns (a1), G. Wiener (a2), S. J. Kidd (a2), D. M. Knotter (a2) and P. K. De Bokx (a2)...

Abstract

Grazing-Emission X-Ray Fluorescence Spectrometry (GEXRF) is a new analytical X-ray fluorescence technique, which like TXRF takes advantage of the total-reflection phenomenon. The main advantage of GEXRF over TXRF is its sensitivity towards light elements. This paper presents straight GEXRF and VPD-DC-GEXRF analysis results for Na, Mg, Al, K and Ca surface contamination on silicon wafers.

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MRS Online Proceedings Library (OPL)
  • ISSN: -
  • EISSN: 1946-4274
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