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Sr/Si Template Formation for the Epitaxial Growth of SrTiO3 on Silicon

Published online by Cambridge University Press:  01 February 2011

Xiaoming Hu ,
Y. Liang ,
Yi Wei ,
J.L. Edwards Jr ,
R. Droopad ,
K. Moore  and
W.J. Ooms
Y. Liang
Affiliation:
Physical Science Research Laboratories - Motorola Labs, 7700 S. River Parkway, Tempe, Arizona 85284
Yi Wei
Affiliation:
Physical Science Research Laboratories - Motorola Labs, 7700 S. River Parkway, Tempe, Arizona 85284
J.L. Edwards Jr
Affiliation:
Physical Science Research Laboratories - Motorola Labs, 7700 S. River Parkway, Tempe, Arizona 85284
R. Droopad
Affiliation:
Physical Science Research Laboratories - Motorola Labs, 7700 S. River Parkway, Tempe, Arizona 85284
K. Moore
Affiliation:
Physical Science Research Laboratories - Motorola Labs, 7700 S. River Parkway, Tempe, Arizona 85284
W.J. Ooms
Affiliation:
Physical Science Research Laboratories - Motorola Labs, 7700 S. River Parkway, Tempe, Arizona 85284
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Abstract

A novel silicon cleaning process using strontium metal thin films has been described. The silicon dioxide de-oxidation process using strontium as catalysts has been studied by X-ray Photoelectron Spectroscopy (XPS) and other in-situ techniques. A Sr/Si template for the epitaxial growth of SrTiO3 single crystals on silicon can be directly formed as a result of the above Sr-de-oxidation process. The de-oxidation mechanism can be explained after solving the interfacial structures of the Sr/SiO2/Si system with in-situ XPS.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 716: Symposium B – Silicon Materials-Processing, Characterization, and Reliability , 2002 , B6.2
Copyright
Copyright © Materials Research Society 2002

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