Skip to main content
    • Aa
    • Aa

Synthesis of Ultrathin Ta-C Films by Twist-Filtered Cathodic Arc Carbon Plasmas

  • André Anders (a1) and Ashok V. Kulkarni (a2)

The application of cathodic-arc-deposited films has been very slow due to the infamous macroparticle problem. We report about the application of the open Twist Filter as the key component to an advanced filtered cathodic arc system. Ultrathin tetrahedral amorphous carbon (ta-C) films have been deposited on 6 inch wafers. Film propertieshave been investigated with respect to application in the magnetic data storage industry. Films can be deposited in a reproducible manner where film thickness control relies on arc pulse counting once deposition rates have been calibrated. Films of 3 nm thickness have been deposited that passed acid and Battelle corrosion tests. Monte Carlo Simulation of energetic carbon deposition shows the formation of an intermixed transition layer of about 1 nm. The simulation indicates that because the displacement energy of carbon isnot smaller than of magnetic materials, films thinner than 2 nm are either not high in sp3 content or represent a carbidic phase.

Hide All
[1]Wei B., Zhang B., and Johnson K. E., J. Appl. Phys., vol. 83, pp. 24912499, 1998.
]2]Stanishevsky A., Chaos, Solitons & Fractals, vol. 10, pp. 20452066, 1999.
[3]Bai M., Kato K., Umehara N., Miyake Y., Xu J., and Tokisue H., Surf. & Coat. Technol., vol. 126, pp. 181194, 2000.
[4]Shi J. R., Shi X., Sun Z., Liu E., Tay B. K., and Jin X. Z., Int. J. Mod. Phys. B, vol. 14, pp.315320, 2000.
[5]Monteiro O. R., Delplancke-Ogletree M.-P., and Brown I. G., Thin Solid Films, vol. 342, pp. 100107, 1999.
[6]Tsai H. and Bogy D. B., J. Vac. Sci. Technol. A, vol. 5, pp. 32873312, 1987.
[7]Bhatia C. S., Fong W., Chen C. Y., Wei J., Bogy D., Anders S., Stammler T., and Stöhr J., IEEE Trans. Magnetics, vol. 35, pp. 910915, 1999.
[8]Goglia P. R., Berkowitz J., Hoehn J., Xidis A., and Stover L., Diamond Rel. Mat., vol. 10, pp. 271277, 2001.
[9]Li X. D. and Bhushan B., J. Mat. Res., vol. 14, pp. 23282337, 1999.
[10]Li X. and Bhushan B., Thin Solid Films, vol. 355 356, pp. 330336, 1999.
[11]Anders S., Bhatia C. S., Fong W., Lo R. Y., and Bogy D. B., Mat. Res. Soc. Symp. Proc., vol. 517, pp. 371382, 1998.
[12]Brown I. G., Rev. Sci. Instrum., vol. 65, pp. 30613081, 1994.
[13]Anders A., IEEE Trans. of Plasma Sci., vol. 29, pp. in print, 2001.
[14]Yushkov G. Y., Anders A., Oks E. M., and Brown I. G., J. Appl. Phys., vol. 88, pp. 56185622, 2000.
[15]Kutzner J. and Miller H. C., J. Phys. D: Appl. Phys., vol. 25, pp. 686693, 1992.
[16]Fallon P. J., Veerasamy V. S., Davis C. A., Robertson J., Amaratunga G. A. J., Milne W. I., and Koskinen J., Phys. Rev. B, vol. 48, pp. 47774782, 1993.
[17]Monteiro O. and Anders A., IEEE Trans. Plasma Sci., vol. 27, pp. 10301033, 1999.
[18]Sanders D. M., Boercker D. B., and Falabella S., IEEE Trans. Plasma Sci., vol. 18, pp. 883894, 1990.
[19]Boxman R. L., Zhitomirsky V., Alterkop B., Gidalevitch E., Beilis I., Keidar M., and Goldsmith S., Surf. & Coat. Technol, vol. 86 87, pp. 243253, 1996.
[20]Boxman R. L. and Goldsmith S., Surf. & Coat. Technol., vol. 52, pp. 3950, 1992.
[21]Anders A., Surf. & Coat. Technol., vol. 120 121, pp. 319330, 1999.
[22]Aksenov I. I., Belous V. A., and Padalka V. G., Instrum. Exp. Tech., vol. 21, pp. 14161418, 1978.
[23]Baldwin D. A. and Fallabella S., “Deposition processes utilizing a new filtered cathodic arc source,” Proc. of the 38th Annual Techn. Conf., Society of Vacuum Coaters, Chicago, 1995, pp. 309316.
[24]Anders S., Anders A., Dickinson M. R., MacGill R. A., and Brown I. G., IEEE Trans. Plasma Sci., vol. 25, pp. 670674, 1997.
[25]Witke T., Schuelke T., Schultrich B., Siemroth P., and Vetter J., Surf. & Coat. Technol, vol.126, pp. 8188, 2000.
[26]Welty R. P., “Rectangular vacuum-arc plasma source.USA: Vapor Technologies, Inc., 1996.
[27]Gorokhovsky V., “Apparatus for Application of Coatings in Vacuum, Rectangular Filter.US, 1995.
[28]Shi X., Tay B. K., Tan H. S., Liu E., Shi J., Cheah L. K., and Jin X., Thin Solid Films, vol. 345, pp. 16, 1999.
[29]Shi X., Tay B. G., and Lau S. P., Int. J. Mod. Phys. B, vol. 14, pp. 136153, 2000.
[30]Storer J., Galvin J. E., and Brown I. G., J. Appl. Phys., vol. 66, pp. 52455250, 1989.
[31]Koskinen J., Anttila A., and Hirvonen J.-P., Surf. Coat. Technol, vol. 47, pp. 180187, 1991.
[32]Anttila A., Salo J., and Lappalainen R., Mat. Letters, vol. 24, pp. 153156, 1995.
[33]Anders A. and MacGill R. A., Surf. & Coat. Technol, pp. presented at the 27th ICMCTF, San Diego, april 10–14, 2000., 2000.
[34]Anders A., Brown I. G., MacGill R. A., and Dickinson M. R., J. Phys. D: Appl. Phys., vol.31, pp. 584587, 1998.
[35]Fong W., “Fabrication and evaluation of 5 nm cathodic-arc carbon films for disk drive applications,” in Department of Mechanical Engineering, Computer Mechanics Laboratory. Berkeley, CA: University of California at Berkeley, 1999.
[36]Anders A., Ryan F. R., Fong W., and Bhatia C. S., “Ultrathin diamondlike carbon films deposited by filteredcarbon vacuum arcs,” IXX Int. Symp. on Discharges and Electrical Insulation in Vacuum, Xi'an, P.R. China, 2000, pp. accepted for publication in IEEE Trans. Plasma Sci. (2001).
[37]Pharr G. M., Callahan D. L., McAdams D., Tsui T. Y., Anders S., Anders A., Ager J. W., Brown I.G., Bhatia C. S., Silva S. R. P., and Robertson J., Appl. Phys. Lett, vol. 68, pp. 779781, 1996.
[38]Schneider D., Witke T., Schwarz T., Schöneich B., and Schultrich B., Surf. & Coat. Technol., vol. 126, pp. 136141, 2000.
[39]Schneider J. M., Appl. Phys. Lett, vol. 76, pp. 15311533, 2000.
[40]Schneider J. M., Anders A., Hjörvarsson B., Petrov I., Macak K., Helmerson U., and Sundgren J.-E., Appl. Phys. Lett, vol. 74, pp. 200202, 1999.
[41]Ziegler J. F., Biersack J. P., and Littmark U., The Stopping and Range of Ions in Solids. New York: Pergamon Press, 1985.
[42]Biersack J. P., Nucl. Instrum. Meth. Phys. Res. B, vol. 59 60, pp. 2127, 1991.
[43]Nastasi M., Mayer J. W., and Hirvonen J. K., Ion-Solid Interactions. Cambridge, UK: Cambridge University Press, 1996.
Recommend this journal

Email your librarian or administrator to recommend adding this journal to your organisation's collection.

MRS Online Proceedings Library (OPL)
  • ISSN: -
  • EISSN: 1946-4274
  • URL: /core/journals/mrs-online-proceedings-library-archive
Please enter your name
Please enter a valid email address
Who would you like to send this to? *


Full text views

Total number of HTML views: 0
Total number of PDF views: 1 *
Loading metrics...

Abstract views

Total abstract views: 51 *
Loading metrics...

* Views captured on Cambridge Core between September 2016 - 19th October 2017. This data will be updated every 24 hours.