Hostname: page-component-8448b6f56d-dnltx Total loading time: 0 Render date: 2024-04-20T02:34:05.182Z Has data issue: false hasContentIssue false
  • English
  • Français

Thermal Annealing Investigation of the Optical Properties of BxN1-X Films Fabricated by Ion Beam Assisted Deposition and Application for an Optical Filter

Published online by Cambridge University Press:  25 February 2011

C.A. Carosella ,
E.P. Donovan ,
G.K. Hubler  and
A.E. Skowronek
C.A. Carosella
Affiliation:
Naval Research Laboratory, Code 4671, Washington, DC 20375-5000
E.P. Donovan
Affiliation:
Naval Research Laboratory, Code 4671, Washington, DC 20375-5000
G.K. Hubler
Affiliation:
Naval Research Laboratory, Code 4671, Washington, DC 20375-5000
A.E. Skowronek
Affiliation:
Naval Research Laboratory, Code 4671, Washington, DC 20375-5000
Get access

Abstract

The annealing behavior of the optical properties of boron nitride films (BxN1-x) is described for films fabricated by ion beam assisted deposition. The data are needed for the precise manufacture of optical filters, where the index of refraction must be predicted from deposition parameters and film annealing history.

The reflection of homogeneous samples deposited at room temperature on (100) silicon substrates was measured from 400 to 3125 nm. to obtain the wavelength dependence of the index of refraction as a function of film nitrogen content. Nitrogen atom fraction was varied from 0.325 to 0.5 by variation of the incident of nitrogen ion beam current to evaporant boron flux ratio. The films were annealed in argon at 500 C and 700 C, and the optical measurements repeated after each anneal. The index of refraction obtained for the annealed films was used to design a narrow band optical reflection filter at 1060 nm. The filter, constructed by sinusoidally varying the index of refraction of the BxN1-x film by varying ‘x’, performed as designed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 157: Symposium A – Beam-Solid Interactions: Physical Phenomena , 1989 , 61
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Sinke, W.C., Warabisako, T., Miyao, M., Tokuyama, T., Roorda, S., Saris, F.W., Mat. Res. Soc. Symp. Procd. 100 (1988).Google Scholar
2 Hubler, G.K., Donovan, E.P., Wang, K.W., Spitzer, W.G., S.P.I.E., 530 222 (1985).Google Scholar
3 Donovan, E.P., Carosella, C.A., Vechten, D. Van, Mat. Res. Soc. Symp. Procd. 128 501 (1988).Google Scholar
4 Hubler, G.K., Carosella, C.A., Donovan, E.P., Vechten, D. Van, Bassel, R.H., Andreadis, T.D., Rosen, M., Muller, G.P., Nucl. Instr. and Meth. in Phys. Res. B, in press.Google Scholar
5 Donovan, E.P., Coleman, W.D., Hubler, G.K., To be published in J. Vac. Sci.Google Scholar
6 Donovan, E.P., Vechten, D. Van, Kahn, A.D.F., Carosella, C.A., Hubler, G.K. Applied Optics, 28 2940 (1989).Google Scholar
7 Strecker, C., Johnson, W., Davidson, J., AD B099120 (1985).Google Scholar
8 Born, M., Wolf, E., “Principles of Optics”, Pergamon Press, 62 (1959).Google Scholar
9 Heavens, O.S., “Optical Properties of Thin Solid Films”, Dover Pub., (1965).Google Scholar