Hostname: page-component-8448b6f56d-c4f8m Total loading time: 0 Render date: 2024-04-24T21:56:10.310Z Has data issue: false hasContentIssue false
  • English
  • Français

Thin Film Metal Oxide Semiconductors Deposited on Polymeric Substrates

Published online by Cambridge University Press:  21 March 2011

Elvira Fortunato ,
Patrícia Nunes ,
António Marques ,
Daniel Costa ,
Hugo Águas ,
Isabel Ferreira ,
Maria E. V. Costa  and
Rodrigo Martins
Elvira Fortunato
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Patrícia Nunes
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
António Marques
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Daniel Costa
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Hugo Águas
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Isabel Ferreira
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Maria E. V. Costa
Affiliation:
Department of Ceramics and Glass Engineering/UIMC, University of Aveiro, 3810-193 Aveiro Portugal
Rodrigo Martins
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Get access

Abstract

Highly textured transparent conducting ZnO:Al thin films have been prepared by r.f. magnetron sputtering. The films were deposited on polyester (Mylar type D, 100 µm thickness) and glass substrates at room temperature. Surface stylus profiling, X-ray diffraction, scanning electron microscopy, transmission electron microscope and Hall effect measurements as a function of temperature have been used to characterize the produced films. The samples are polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-axis orientation (002) perpendicular to the substrate surface (columnar structure). The ZnO:Al thin films with a resistivity as low as 3.6×10−2 µcm have been obtained, as deposited.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 666: Symposium F – Transport and Microstructural Phenomena , 2001 , F11.3
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Hartnagel, H.L., Dawar, A.L., Jain, A.K., Jagadish, C., “Semiconducting Transparent Thin Films” (IOP, 1995).Google Scholar
[2] Han, B.M., Chang, S., Kim, S.Y., Thin Solid Films 338, 265 (1999).Google Scholar
[3] Park, K.C., Ma, D.Y., Kim, K.H., Thin Solid Films 305, 201 (1997).Google Scholar
[4] Hu, J., Gordon, R.G., J. Appl. Phys. 71, 880 (1992).Google Scholar
[5] Kim, J.S., Marzouk, H.A., Reucroft, P.J., Hamrin, C.E., Thin Solid Films 217, 133 (1992).Google Scholar
[6] Miki-Yoshida, M., Paraguay-Delgado, F., pez, W. Estrada-Ló, Andrade, E., Thin Solid Films 376, 99 (2000).Google Scholar
[7] Nunes, P., Fernandes, B., Fortunato, E., Vilarinho, P., Martins, R., Thin Solid Films 337, 176 (1999).Google Scholar
[8] Shuler, T., Aegerter, M.A., Thin Solid Films 351, 125 (1999).Google Scholar
[9] Ohyama, M., Kozuka, H., Yoko, T., J. Am. Ceram. Soc. 81, 1622 (1998).Google Scholar
[10] Ritala, M., Asikanen, T., Leskelä, M., Skarp, J., Mater. Res. Soc. Symp. Proc. 426, 497 (1996).Google Scholar
[11] Hayamizu, S., Tabata, H., Tanaka, H., Kawai, T., J. Appl. Phys. 80, 787 (1996).Google Scholar
[12] Zhang, D.H., Yang, T.L., Ma, J., Wang, Q.P., Gao, R.W., Ma, H.L., Applied Surface Science 158, 43 (2000).Google Scholar
[13] Gates, S.M., Mat. Res. Soc. Symp. Proc., 467 (1997) 843.Google Scholar
[14] Fortunato, E., Brida, D., Ferreira, I., Águas, H., Nunes, P., Martins, R., Thin Solid Films 383 (2001) 310.Google Scholar
[15] Nunes, P., Costa, D., Fortunato, E., Martins, R.: Vacuum (2001), in print.Google Scholar
[16] http://www.dupontteijinfilms.comGoogle Scholar
[17] Yoshino, Y., Inoue, K., Takeuchi, M., Makino, T., Katayama, Y., Hata, T., Vacuum 59, 403 (2000).Google Scholar
[18] Williams, D.B., Carter, C.B., “Transmission Electron Microscopy” (Plenum Press, 1996).Google Scholar