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XTEM characterization of modulated ion implantation through self-organized anodic aluminum oxide (AAO) membranes

Published online by Cambridge University Press:  19 April 2012

Wei Guan
Affiliation:
NanoLAB Centre, Department of Materials Science and Engineering, University of Sheffield, Sheffield, S1 3JD, United Kingdom
Jay Ghatak
Affiliation:
NanoLAB Centre, Department of Materials Science and Engineering, University of Sheffield, Sheffield, S1 3JD, United Kingdom
Nianhua Peng
Affiliation:
Surrey Ion Beam Centre, Advanced Technology Institute, University of Surrey, Guildford, Surrey, GU2 7XH, United Kingdom
Yong Peng
Affiliation:
NanoLAB Centre, Department of Materials Science and Engineering, University of Sheffield, Sheffield, S1 3JD, United Kingdom
Chris Jeynes
Affiliation:
Surrey Ion Beam Centre, Advanced Technology Institute, University of Surrey, Guildford, Surrey, GU2 7XH, United Kingdom
Günter Möbus
Affiliation:
NanoLAB Centre, Department of Materials Science and Engineering, University of Sheffield, Sheffield, S1 3JD, United Kingdom
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Abstract

Penetration of a nanochannel mask by 190keV Co+ ions is tested for the purpose of achieving laterally modulated ion implantation into a SiO2 thin film on a Si substrate. A 2D-nanoporous membrane of anodic aluminum oxide (AAO) is chosen as the mask. Criteria and challenges for designing the mask are presented. Implantation experiments through a mask with pore diameter of 125 nm and inter-pore distance of 260 nm are carried out. Cross-sectional TEM (XTEM) is shown as an ideal tool to assess depth distribution and lateral distribution of implanted ions at the same time, complemented by Rutherford backscattering spectroscopy. Using energy dispersive x-ray spectroscopy linescans, a Co distribution with lateral modulation is found at 120 nm below the oxide surface. First experiments in converting the atomic distribution of Co to discrete nanoparticles by in-situ TEM annealing are presented.

Type
Research Article
Copyright
Copyright © Materials Research Society 2012

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References

REFERENCES

1. Bhushan, B. (Editor), Springer Handbook of Nanotechnology, New York: Springer (2010)Google Scholar
2. Yakushiji, K., Mitani, S., Ernult, F., Takanashi, K. and Fujimori, H., Phys. Rep.-Rev. Sec. Phys. Lett. 451, 1 (2007)Google Scholar
3. Kelly, K., Coronado, E., Zhao, L. and Schatz, G., J. Phys. Chem. B 107, 668 (2003)Google Scholar
4. Ajayan, P., Schadler, L. and Braun, P., Nanocomposite science and technology, Weinheim: Wiley (2003)Google Scholar
5. Hernández-Vélez, M., Sanz, R., Manso, M., Sánchez, O., De Melo, O., Asenjo, A., Mínguez-Bacho, I. and Vázquez, M., Mater. Res. Soc. Symp. Proc. 1285, 1258–Q09-02 (2010)Google Scholar
6. Sanz, R., Johansson, A., Skupinski, M., Jensen, J., Possnert, G., Boman, M., Vázquez, M. and Hjort, K., Nano Lett. 6, 1065 (2002)Google Scholar
7. Almawlawi, D., Bosnick, K., Osika, A. and Moskovits, M., Adv. Mater. 12, 1252 (2000)Google Scholar
8. Shin, S., Lee, S., Lee, J., Whang, C., Lee, J-H, Choi, I-H, Kim, T. and Song, J., Nanotechnology 16, 1392 (2005)Google Scholar
9. Guan, W., Ghatak, J., Peng, Y., Peng, N., Jeynes, C., Inkson, B. and Möbus, G., Nanotechnology 23, 045605 (2012)Google Scholar
10. Shin, K., Leach, K., Goldbach, J., Kim, D., Jho, J., Tuominen, M., Hawker, C. and Russell, T., Nano Lett. 2, 933 (2002)Google Scholar