Periodic wrinkles or corrugations can appear on the free surfaces of constrained hydrogel films. The constraint generates a residual compressive stress that is partially relieved through deviation of free surfaces from a planar configuration. The morphology, amplitude and wavelength of the surface instability are generally well-defined and depend on the strength of the constraint. If swelling of the hydrogel overcomes the constraint, the film can slip along its substrate, altering the resultant compressive stress and surface topography. By tuning this slippage, we aim to direct the surface features presented by thin hydrogel films. Active control of surface morphology could have important implications in several applications ranging from sensors to controlled cell attachment and detachment.

In this work, we discuss a method of tuning the amount of slippage and surface topography of patterned poly(N-isopropylacrylamide) (poly-NIPAAm) films. The films were fabricated from photo-crosslinkable polymers comprising NIPAAm and photo-active methacroyloxy-benzophenone (MaBP) monomers. The patterned films were anchored to a substrate through a hydrogen-bonding self-assembled monolayer. The relationship between pattern geometry, pattern dimensions, and solvent were investigated with respect to the mechanical instability generated at the free surface. We observed that the wavelength, width, and amplitude of the instability always increased with the thickness of the polymer pattern. The morphology of the surface instability, however, was especially sensitive to thickness of the pattern, the solvent, and the spatial position with respect to the edge of polymer pattern. If the slippage of the film against the substrate is minimal, a wrinkle pattern in the form of bicusps was observed. If the compressive stress exceeded the hydrogen-bonding anchors, slippage of the film generated either a blister pattern or a honeycomb pattern.