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Study of the Effects of Si Addition on the Properties of Hard Nanocomposite Thin Films

Published online by Cambridge University Press:  26 July 2012

Jose Luis Endrino ,
Sergio Palacin ,
Alejandro Gutierrez ,
Myriam Aguirre  and
Franz Schäfers
Jose Luis Endrino
Affiliation:
jlendrino@lbl.gov, Lawrence Berkeley National Laboratory, AFRD, 1 Cyclotron Rd. Building 53, Berkeley, CA, 94720, United States
Sergio Palacin
Affiliation:
s.palacin@uam.es, Universidad Autonoma de Madrid, Madrid, N/A, Spain
Alejandro Gutierrez
Affiliation:
a.gutierrez@uam.es, Universidad Autonoma de Madrid, Madrid, N/A, Spain
Myriam Aguirre
Affiliation:
myriam.aguirre@empa.ch, Empa-Swiss Federal Lab for Materials Testing and Research, Duebendorf, N/A, Switzerland
Franz Schäfers
Affiliation:
schaefers@bessy.de, BESSY GmbH, Berlin, N/A, Germany
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Abstract

In the present study, hard TiSiN coating compounds with different Si content have been deposited by the magnetron sputtering technique. X-ray diffraction (XRD) and X-ray absorption spectroscopy (XAS) have been employed to investigate the effects of Si addition on the composition, structure and phase development of the cubic NaCl-type structure. To get some insight on these changes, X-ray absorption spectra have been measured at the Ti and Si K-edges in fluorescence yield mode. The collected data showed that the interaction between Ti and Si was weak and the formation of a-Si3N4 can be assumed. Hardness measurements were also consistent with the formation of hard nanocomposite films. A maximum hardness of about 36 GPa was obtained for the sample with 11 at. % Si.

Keywords

sputteringnitridenanostructure
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 976: Symposium EE – Size Effects in the Deformation of Materials – Experiments and Modeling , 2006 , 0976-EE03-18
Copyright
Copyright © Materials Research Society 2007

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