Hostname: page-component-76fb5796d-25wd4 Total loading time: 0 Render date: 2024-04-25T14:25:13.320Z Has data issue: false hasContentIssue false
  • English
  • Français

Real-Time Monitoring of Indium Tin Oxide Laser Ablation in Liquid Crystal Display Patterning

Published online by Cambridge University Press:  15 February 2011

M.H. Hong ,
Y.F. Lu ,
M. Meng  and
T.S. Low
M.H. Hong
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore119260
Y.F. Lu
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore119260
M. Meng
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore119260
T.S. Low
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore119260
Get access

Abstract

Audible acoustic wave detection is applied to investigate KrF excimer laser ablation of Indium Tin Oxide (ITO) thin film layer for Liquid Crystal Display (LCD) patterning. It is found that there is no acoustic wave generation if laser fluence is lower than ITO ablation threshold. For laser fluence higher than the threshold, audible acoustic wave will be detected due to shock wave generation during ITO laser ablation. The amplitude of the acoustic wave is closely related to the laser ablation rate. With more laser pulse applied, the amplitude is dropped to zero because the ITO layer is completely removed. However, if laser fluence is increased higher than ablation threshold for glass substrate, the amplitude is also dropped with pulse number but not to zero. It is due to laser ablation of ITO layer and glass substrate at the same time. Since the thickness of ITO layer is in a scale of 100 nm, laser interaction with glass substrate will happen even at the first pulse of high laser fluence irradiation. Laser ablation induced ITO plasma emission spectrum in visible light region is analyzed by an Optical Multi-channel Analyzer (OMA). Specific spectral lines are In I (325.8, 410.2 and 451.1 nm) and In II 591.1 nm. Spectral intensities of 410.2 and 451.1 nm lines are selected to characterize the evolution of ITO plasma intensity with laser fluence and pulse number. It is found that the spectral intensities are reduced to zero with laser pulse number. It is also found that spectral lines other than ITO plasma will appear for laser fluence higher than ablation threshold for glass substrate. Threshold fluences for glass and ITO ablation are estimated for setting up a parameter window to control LCD patterning in real-time.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 526: Symposium Y – Advances in Laser Ablation of Materials , 1998 , 91
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Tahar, R.B.H., Ban, T., Ohya, Y., and Takahashi, Y., J. Appl. Phys. 83, 2631 (1998).Google Scholar
2. Ow-Yang, C.W., Spinner, D., Shigesato, Y. and Paine, D.C., J. Appl. Phys. 83, 148 (1998).Google Scholar
3. Takai, M., Bollmann, D. and Haberger, K., Appl. Phys. Lett. 64, 2560 (1994).Google Scholar
4. Mohri, M., Kakinuma, H., Sakamoto, M., and Sawai, H., Jpn. J. Appl. Phys. 29, L1932 (1990).Google Scholar
5. Hoheisel, M., Mitwalsky, A., and Mrotzek, C., Phys. Status Solidi A 123, 461 (1991).Google Scholar
6. Knickerbocker, S.A. and Kulkarni, A.K., J. Vac. Sci. Technol. A 14, 757 (1996).Google Scholar
7. Szorenyi, T., Laude, L.D., Bertoti, I., Kantor, Z. and Geretovszky, Zs., J. Appl. Phys. 78, 6211 (1995).Google Scholar
8. Lu, Y.F., Hong, M.H., Chua, S.J., Teo, B.S., and Low, T.S., J. Appl. Phys. 79, 2186 (1996).Google Scholar
9. Lu, Y.F., Hong, M.H. and Aoyagi, Y. in Beam-Solid Interactions for Materials Synthesis and Characterization, edited by Jacobson, D.C., Luzzi, D.E., Heinz, T.F., and Iwaki, M. (Mater. Res. Soc. Proc. 354, Pittsburgh, PA 1995), p.483–488.Google Scholar
10. Massachusetts Institute of Technology Wavelength Tables, Edited by Harrison, G.R. (John Wiley & Sons, New York, 1969), p. xix.Google Scholar