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Molybdenum doped Indium Oxide thin films prepared by rf sputtering

Published online by Cambridge University Press:  26 February 2011

Elamurugu Elangovan ,
Antonio Marques ,
Ana Pimentel ,
Rodrigo Martins  and
Elvira Fortunato
Elamurugu Elangovan
Affiliation:
elam@fct.unl.pt, FCT-UNL, Materials Science, Portugal
Antonio Marques
Affiliation:
elvira.fortunato@fct.unl.pt, FCT-UNL, Materials Science, Portugal
Ana Pimentel
Affiliation:
elvira.fortunato@fct.unl.pt, FCT-UNL, Materials Science, Portugal
Rodrigo Martins
Affiliation:
rm@uninova.pt, FCT-UNL, Materials Science, Portugal
Elvira Fortunato
Affiliation:
elvira.fortunato@fct.unl.pt, FCT-UNL, Materials Science, Portugal
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Abstract

Molybdenum doped indium oxide (IMO) thin films rf sputtered at room temperature were studied as a function of oxygen volume percentage (O2 vol. %) varied between 0 and 17.5. The as-deposited films were amorphous irrespective of O2 vol. %. The minimum transmittance (<10 %) of the films deposited without oxygen has been increased on introducing oxygen (3.5 O2 vol. %) to a maximum of 90 %. The optical band gap has been increased from 3.80 eV (without oxygen) to 3.92 eV (3.5 O2 vol. %). The films were highly resistive and the hall coefficients were detectable only for the films deposited without oxygen. In order to increase the electrical conductivity, the films were annealed in the range 100-500°C in open-air and N2/H2 gas for 1 hour. The annealed films become polycrystalline with enhanced electrical and optical properties. The effect of annealing conditions on these films will be presented and discussed in detail.

Keywords

transparent conductorsputteringstructural
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 905: Symposium DD – Materials for Transparent Electronics , 2005 , 0905-DD05-10
Copyright
Copyright © Materials Research Society 2006

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