Hostname: page-component-8448b6f56d-c47g7 Total loading time: 0 Render date: 2024-04-24T07:34:23.759Z Has data issue: false hasContentIssue false
  • English
  • Français

Fabrication of Silicon on Borosilicate Glass Microarrays for Quantitative Live Cell Imaging

Published online by Cambridge University Press:  13 July 2011

David T. Martin ,
Sergio Sandoval ,
Andy Carter ,
Mark Rodwell ,
Stefan Smith ,
Andrew C. Kummel  and
Davorka Messmer
David T. Martin
Affiliation:
Departments of Electrical & Computer Engineering, University of California San Diego, 9500 Gilman Dr., La Jolla CA 92093.
Sergio Sandoval
Affiliation:
Departments of Bioengineering, University of California San Diego, 9500 Gilman Dr., La Jolla CA 92093.
Andy Carter
Affiliation:
Department of Electrical & Computer Engineering, University of California, Santa Barbara, CA 93106.
Mark Rodwell
Affiliation:
Department of Electrical & Computer Engineering, University of California, Santa Barbara, CA 93106.
Stefan Smith
Affiliation:
Departments of Mechanical & Aerospace Engineering, University of California San Diego, 9500 Gilman Dr., La Jolla CA 92093.
Andrew C. Kummel
Affiliation:
Departments of Chemistry & Biochemistry, Nanoengineering, University of California San Diego, 9500 Gilman Dr., La Jolla CA 92093.
Davorka Messmer
Affiliation:
Departments of Moores Cancer Center, University of California San Diego, 9500 Gilman Dr., La Jolla CA 92093.
Get access

Abstract

Planar arrays of microwells were fabricated in Silicon on borosilicate glass (pyrex) substrates in order to facilitate live cell fluorescence imaging experiments for cells sequestered inside their own individual microenvironments for incubation and quantification of single cell seceretions. Two methods of deep silicon etching were compared: cryogenic deep reactive ion etching (DRIE) and time multiplexed DIRE (Bosch Process). A 200um Si wafer was bonded to a 500um pyrex substrate. Cryogenic DRIE allowed for the reliable fabrication of 75-100um deep microwells with 60x60um openings across a 10x10mm substrate while the Bosh Process allowed for etching entirely through the Si layer, producing 200um deep microwells with transparent bottoms and steep sidewalls while maintaining the target 60x60um opening geometry.

Keywords

biologicalmicrostructureSi
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1346: Symposium AA – Micro- and Nanofluidic Systems for Materials Synthesis, Device Assembly and Bioanalysis , 2011 , mrss11-1346-aa04-02
Copyright
Copyright © Materials Research Society 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Czerkinsky, C., Andersson, G., Ekre, H.P., Nilsson, L.A., Klareskog, L., Ouchterlony, O., “Reverse ELISPOT assay for clonal analysis of cytokine production I. Enumeration of gamma-interferon-secreting cells”, J. of Immunological Methods 110, 1 (1988).Google Scholar
2. Jung, T., Schauer, U., Heusser, C., Neumann, C., Rieger, C., “Detection of intracellular cytokines by flow cytometry”, J. of Immunological Methods 159, 1–2 (1993).Google Scholar
3. Manz, R., Assenmacher, M., Pfluger, E., Miltenyi, S., Radbruch, A., “Analysis and sorting of live cells according to secreted molecules, relocated to a cell-surface affinity matrix” Proc Natl Acad Sci 92,6 (1995).Google Scholar
4. Czerkinsky, C., Moldoveanu, Z., Mestecky, J., Nilsson, L. A., Ouchterlony, O., “A novel two colour ELISPOT assay. I. Simultaneous detection of distinct types of antibody-secreting cells”, J. Immunol. Methods 115, 1 (1988).Google Scholar
5. Rodriguez-Caballero, A., Garcia-Montero, A. C., Bueno, C., Almeida, J., Varro, R., Chen, R., Pandiella, A., Orfao, A., “A new simple whole blood flow cytometry-based method for simultaneous identification of activated cells and quantitative evaluation of cytokines released during activation”, Lab Invest 84, 10 (2004).Google Scholar
6. Jansen, H., de Boer, M., Wensink, H., Kloeck, B., Elwenspoek, M., “The black silicon method. VIII. A study of the performance of etching silicon using SF6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source”, Microelectronics Journal 32, 9 (2001).Google Scholar
7. White, J.G., Amos, W.B., and Fordham, M., “An evaluation of confocal versus conventional imaging of biological structures by fluorescence light microscopy.” The Journal of Cell Biology 105,1 (1987).Google Scholar
8. de Boer, M.J., Gardeniers, J. G. E., Jansen, H. V., Smulders, E., Glide, M.-J., Roelofs, G., Sasserath, J. N., Elwenspoek, M., “Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures” Journal of Microelectromechanical Systems 11, 4(2002).Google Scholar
9. Laerme, F.,. et al. in Bosch deep silicon etching: improving uniformity and etch rate for advanced MEMS applications, (Twelfth IEEE International Conference on MEMS ’99, Orlando, Florida, 1999).Google Scholar
10. Walker, M. J., “Comparison of Bosch and cryogenic processes for patterning high aspect ratio features in silicon”, Proc. SPIE 4407 (2001).Google Scholar