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Optical-based Flux Monitoring of Atomic Antimony Sources for Molecular Beam Epitaxy

Published online by Cambridge University Press:  15 February 2011

P. D. Brewer  and
K. P. Killeen
P. D. Brewer
Affiliation:
Hughes Research Laboratories, 3011 Malibu Canyon Road, Malibu, CA
K. P. Killeen
Affiliation:
Sandia National Laboratories, Albuquerque, NM
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Abstract

In this paper we discuss the use of optical-based flux monitoring (OFM) for real-time control of atomic antimony fluxes for applications in molecular beam epitaxy. Atomic antimony beams were generated using a two-zone cracking effusion cell. The product distribution of the source was characterized using a time-of-flight mass spectrometer employing resonance-enhanced laser ionization. A double-pass OFM system has been developed to monitor the atomic antimony beam that is capable of precise flux measurement during MBE growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 406: Symposium L – Diagnostic Techniques for Semiconductor Materials Processing , 1995 , 109
Copyright
Copyright © Materials Research Society 1996

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References

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