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Roughness Effect on the Lithium Diffusivity in WO3 Thin Films

Published online by Cambridge University Press:  16 February 2011

M. Maaza
Affiliation:
Institut d'Optique Th éorique et Appliquée, associé au CNRS, Bat. 503, 91405 Orsay, France
A. Gorenstein
Affiliation:
Laboratoire de Physique des Solides, associd au CNRS, Universit é Pierre et Marie Curie 4 place Jussieu, 75252 Paris Cedex 05, France
C. Sella
Affiliation:
Laboratoire de Physique des Mat ériaux du CNRS, 92195 Meudon Principal, France
F. Bridou
Affiliation:
Institut d'Optique Th éorique et Appliquée, associé au CNRS, Bat. 503, 91405 Orsay, France
B. Pardo
Affiliation:
Institut d'Optique Th éorique et Appliquée, associé au CNRS, Bat. 503, 91405 Orsay, France
J. Corno
Affiliation:
Institut d'Optique Th éorique et Appliquée, associé au CNRS, Bat. 503, 91405 Orsay, France
G. Rogera
Affiliation:
Institut d'Optique Th éorique et Appliquée, associé au CNRS, Bat. 503, 91405 Orsay, France
O. Bohnke
Affiliation:
Laboratoire des Fluorures, Universit é du Maine, route de Laval, B.P.535 72017 Le Mans Cedex, France
C. Julien
Affiliation:
Laboratoire de Physique des Solides, associd au CNRS, Universit é Pierre et Marie Curie 4 place Jussieu, 75252 Paris Cedex 05, France
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Abstract

In this work, we investigate the influence of surface roughness on the kinetics of Li+ during the insertion process in the well-known electrochromic material WO3. Thin films 500 Å thick have been grown by rf-sputtering and annealed in therange of 25-350ºC. Grazing angle X-ray reflectometry shows that the film roughnessincreases considerably with thermal treatment. These measurements are correlated with chemical diffusion investigations obtained by electrochemical titration in Li/WO3 cells.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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