Hostname: page-component-7c8c6479df-hgkh8 Total loading time: 0 Render date: 2024-03-28T21:44:43.293Z Has data issue: false hasContentIssue false

Formation ofWell-defined Nanocolumns by Ion Tracking Lithography

Published online by Cambridge University Press:  15 February 2011

T.E. Felter
Affiliation:
Lawrence Livermore National Laboratory, PO Box 808, L - 356, Livermore, CA, 94550, USAe-mail:felter1@llnl.govwebsite: www-cms.llnl.gov/bios/felter_tbio.html
R. G. Musket
Affiliation:
Musket Consulting, 3877 MeadowWood Dr., El Dorado Hills, CA 95762
J. Macaulay
Affiliation:
Multibeam Systems Inc., 2238 Martin Avenue, Santa Clara, CA 95050
R. J. Contolini
Affiliation:
Novellus Systems, Tualatin, OR
P. C. Searson
Affiliation:
Dept. of Materials Science and Engineering and Dept. of Chemical Engineering, Johns Hopkins University, 3400 North Charles Street, Baltimore, MD 21218
Get access

Abstract

Low dimensional systems on the nanometer scale afford a wealth of interesting possibilities including highly anisotropic behavior and quantum effects. Nanocolumns permit electrical and mechanical contact, yet benefit from two confined dimensions. This confinement leads to new optical, mechanical, electrical, chemical, and magnetic properties. We construct nanocolumn arrays with precise definition and independent control of diameter, length, orientation, areal density and composition so that geometry can be directly correlated to the quantum physical property of interest. The precision and control are products of the fabrication technique that we use. The process starts with an ion of sufficient energy to “track” a dielectric such as a film applied uniformly onto a substrate. The energy loss of the ion alters chemical bonding in the dielectric along the ion's straight trajectory. A suitable etchant quickly dissolves the latent tracks leaving high aspect ratio holes of small diameter (∼10nm) penetrating a film as thick as several microns. These small holes are interesting and useful in their own right and can be made to any desired size by continuing the etching process. Moreover, they serve as molds for electrochemical filling. After this electrodeposition, the mold material can be removed leaving the columns firmly attached to the substrate at the desired orientation. A variety of structures can be envisioned with these techniques. As examples, we have created arrays of Ni and of Pt nanocolumns (∼ 60 nm diameter and ∼ 600 nm long) oriented perpendicular to the substrate. The high aspect ratio and small diameter of the columns enables easy observation of quantum behavior, namely efficient electron field emission and Fowler Nordheim behavior.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

references

1. Komnik, Yu. F., Bukhshtab, E. I., Nikitin, Yu. V., and Adrievskii, V. V., Sov. Phys. JETP 33, 364 (1971)Google Scholar
2. Beutler, D. E., Meisenheimer, T. L., and Giordano, N., Phys. Rev. Lett. 58, 1240 (1987)Google Scholar
3. Birge, N. O., Golding, B., and Haemmerle, W. H., Phys. Rev. Lett. 62, 195, (1989)Google Scholar
4.Peter Searson, unpublished.Google Scholar
5. SR, Nicewarner-Pena, RG, Freeman, BD, Reiss, He, L, DJ, Pena, ID, Walton, Cromer, R, CD, Keating, MJ, Natan, Science 294 p137 (2001)Google Scholar
6. Bernhardt, A. F., Contolini, R. J., Jankowski, A., Liberman, V., Morse, J., Musket, R. G., Barton, R., Macaulay, J., and Spindt, C., J. Vac. Sci. Technol. B 18 (2000) 1212 Google Scholar
7. Liu, K., Chien, C.L., Searson, P.C., and Yu-Zhang, K., Appl. Phys. Lett. 73, 1436 (1998)Google Scholar
8. Liu, K., Chien, C.L., and Searson, P.C., Phys. Rev. B. 58, 14681 (1998)Google Scholar
9. Hong, K., Yang, F. Y., Liu, K., Reich, D. H., Searson, P. C., Chien, C. L., Balakirev, F. F., and Boebinger, G. S., J. Appl. Phys. 85, 6184 (1999)Google Scholar
10. Yang, F. Y., Liu, K., Hong, K., Reich, D. H., Searson, P. C., and Chien, C. L., Science 284, 1335 (1999)Google Scholar
11. Fleischer, R. L., Price, P. B., and Walker, R.M., Nuclear Tracks in Solids: Principles and Applications (University of California Press, Berkeley, CA, 1975).Google Scholar
12. Durrani, S. A. and Bull, R. K., Solid State Nuclear Track Detection: Principles, Methods, and Applications (Pergamon Press, New York, 1987).Google Scholar
13. Spohr, R., Ion Tracks and Microtechnology: Principles and Applications (Vieweg, Braunschweig, Germany, 1990)Google Scholar
14. Fleischer, R. L., Tracks to Innovation: Nuclear Tracks in Science and Technology (Springer-Verlag, New York, 1998)Google Scholar
15. Enge, W., Rad. Meas. 25, 11 (1995)Google Scholar
16. Siwy, Z. and Fulinski, A., Phys. Rev. Lett, 89 (2002) 198103–1Google Scholar
17. Gruhn, T. A. and Benton, E. V., in Solid State Nuclear Track Detectors, Fowler, P. H. and Clapham, V. M. (eds) (Pergamon, New York, 1981), p69.Google Scholar
18. Musket, R. G., Mat. Res. Soc. Symp. Proc. 621, r1.2.1 (2000).Google Scholar