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Microstructural Control of RuO2 Electrode and the Related Properties of (Ba, Sr)TiO3 Thin Films

Published online by Cambridge University Press:  10 February 2011

D.K. Choi
Affiliation:
Dept. of Inorganic Materials Engineering, Hanyang University, Seoul 133–791, Korea, duck@hyunp1.hanyang.ac.kr
J.Y. Choi
Affiliation:
Dept. of Inorganic Materials Engineering, Hanyang University, Seoul 133–791, Korea, duck@hyunp1.hanyang.ac.kr
J.H. Won
Affiliation:
Dept. of Materials Engineering, Hlanyang University, Seoul 133–791, Korea
S.H. Paek
Affiliation:
Dept. of Materials Engineering, Hlanyang University, Seoul 133–791, Korea
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Abstract

Effect of microstructure and surface roughness of oxide electrode on the properties of BST films has been investigated. (Ba, Sr)TiO3 and RuO2 films were deposited by RF magnetron sputtering technique. Surface morphology of RuO2 films were controlled by changing the O2/Ar ratio during deposition. It is found that the grain size and surface roughness of BST films are strongly influenced by RuO2 electrode underneath. When the grain size of RuO2 decreased by reducing either O2/Ar ratio during sputtering or film thickness, BST film resulted in fine grain structure and the leakage current decreased due to the improvement in uniformity of the film. Dielectric constant of BST films, however, was decided from both degree of well defined grains and film continuity related to grain size and surface roughness.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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