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Simulation of Alkali Migration in β′′-Alumina Under Ion Bombardment

Published online by Cambridge University Press:  15 February 2011

Paulo C.T. D’Ajello  and
André A. Pasa
Paulo C.T. D’Ajello
Affiliation:
Departamento de Fisica, CFM/UFSC, P. O. Box 476, 88040-900 Florianópolis, SC, Brazil.
André A. Pasa
Affiliation:
Departamento de Fisica, CFM/UFSC, P. O. Box 476, 88040-900 Florianópolis, SC, Brazil.
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Abstract

Among the different effects induced by ion implantation into dielectric solids, the enhancement of the ionic mobility is the most important regarding practical applications. We simulated the Na migration in a super-ionic conductor, sodium β″-alumina, irradiated with Ar (E=200 keV) at room temperature. A theoretical model to describe the electric field originated in the bombarded region near the surface was developed. The model emphasizes the relation between the electric field and the energy deposited by the ions in the ionization process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 389: Symposium R – Modedling and Simulation of Thin-Film Processing , 1995 , 41
Copyright
Copyright © Materials Research Society 1995

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References

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