Hostname: page-component-76fb5796d-22dnz Total loading time: 0 Render date: 2024-04-25T20:38:46.712Z Has data issue: false hasContentIssue false

High Quality In1-x(Gax)AsyP1-y/InP Compressive Strained Quantum Well Structures Grown by LP-MOCVD

Published online by Cambridge University Press:  10 February 2011

J. T. Zhu
Affiliation:
ECE Department, University of California, San Diego, La Jolla, CA 92037–0407
A. R. Clawson
Affiliation:
ECE Department, University of California, San Diego, La Jolla, CA 92037–0407
P. K. L. Yu
Affiliation:
ECE Department, University of California, San Diego, La Jolla, CA 92037–0407
Get access

Abstract

We report the results of the growth of InAsyP1−y /InP and In0.86Ga0.14AS0.51P0.49/ In0.86Ga0.14As0.33P0.67 compressive strained multiple quantum wells (CSMQW) structures grown by low pressure metalorganic chemical vapor deposition (LP-MOCVD). Our studies showed high quality 1.06 μm InAs0.21P0.79/InP CSMQW structure with 6 periods can be obtained when the growth temperature is around 650°C and the pressure in the reactor is about 20 Torr. When the well thickness and composition are tuned for wavelength around 1.30 μm, the quality of this structure degrades. By employing 1.1 μm wavelength, lattice-matched InGaAsP as the barrier layers and setting the growth temperature at 600 °C, high quality 1.30 μm wavelength In0.86Ga0.14AS0.51P0.49/ In0.86Ga0.14As0.33P0.67 CSMQW materials with 10 periods can also be obtained. The materials were characterized with high resolution x-ray rocking curves, room and low temperature photoluminescence (PL). The 15K full-width-at-half-maximums (FWHM) of the PL peaks for 1.06 μm InAs0.21P0.79/InP and 1.30 μm In0.86Ga0.14AS0.51P0.49/ In0.86Ga0.14As0.33P0.67 CSMQW structures are 5.6 meV and 4.97 meV, respectively, which are among the smallest FWHMs reported up to date for these kinds of MOCVD growth materials. Buried heterostructure lasers at 1.3 μm wavelength have been obtained with the CSMQWs as the active layer.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Wakita, K., Kotaka, I., Amano, T. and Sugiura, H., Electronics Letters, 31 P. 1,339 (1995).Google Scholar
2. Woodward, T.K., Chiu, T.-H., and Sizer, T. II., Applied physics letters, 60, P. 2846 (1992).Google Scholar
3. Soole, J. B. D., LeBlanc, H.P., Andreadakis, N.C., Caneau, C., Bhat, R., and Koza, M.A., Electronics Letters, 31, P. 1276 (1995).Google Scholar
4. Kasukawa, A., Yokouchi, N., Yamanaka, N., and Iwai, N., Electronics Letters, 31, P. 1749 (1995).Google Scholar
5. Chin, M.K., Yu, P.K.L., Chang, W.S.C., IEEE J. Quantum Electron., 27, P. 696 (1991).Google Scholar
6. Bastard, G., Mendez, E.E., Chang, L.L., and Esaki, L., Phys. Rev., B28, P.3241 (1983).Google Scholar
7. Bi, W. G. and Tu, C.W., I. Appl. Phys., 78, P. 2889 (1995).Google Scholar
8. Nakao, M., Oohashi, H., Sugiura, H., J. Appl. Phys., 78, P. 3462 (1995).Google Scholar