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Performances Presented by Large Area ZnO Thin Films Deposited by Spray Pyrolysis

Published online by Cambridge University Press:  17 March 2011

Patrícia Nunes
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Antonio Marques
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Elvira Fortunato
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Rodrigo Martins
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
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Abstract

In this work we present the results of a study on the uniformity of ZnO thin films produced by spray pyrolysis. The properties of the thin films depend essentially on the carrier gas pressure and gas flow used. The best films for optoelectronic applications were obtained with a carrier gas pressure of 2 bar and solution flow of 37 ml/min. The velocity of the nozzle affects essentially the uniformity of the ZnO thin films. However this important characteristic of the large area thin films is independent of the nature (doped and undoped) of the thin film and exhibits a high dependence on the variation of the temperature along the substrate.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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