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Formation of ordered arrays of gold particles on silicon and silicon-dioxide by nanoindentation patterning

Published online by Cambridge University Press:  31 January 2011

Simon Ruffell
Affiliation:
simon.ruffell@anu.edu.au, Australian National University, EME/RSPE, Canberra, Australian Capital Territory, 0200, Australia
Dinesh Kumar Venkatachalam
Affiliation:
Dinesh.Venkatachalam@anu.edu.au, Australian National University, Canberra, Australian Capital Territory, Australia
Avi Shalav
Affiliation:
avi.shalav@anu.edu.aua.shalav@gmail.com, The Australian National University, Electronic Materials Engineering, The Research School of Physical Sciences and Engineering, Building 60; ANU Campus, Canberra, Australian Capital Territory, 2602, Australia
Robert G. Elliman
Affiliation:
rob.elliman@anu.edu.au, Australian National University, Canberra, Australian Capital Territory, Australia
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Abstract

Ordered arrays of gold particles have been fabricated on gold-coated Si(100) surfaces by pre-patterning the surface with a nanoindenter. During thermal annealing the Au is observed to accumulate within the residual indents. Once nucleated, the Au particles grow at the expense of smaller surface particles via an Ostwald-ripening process. The size of the Au particles is controlled by the initial thickness of the deposited Au layer, the size of the indentation (which is controlled with a high degree of precision), and the annealing conditions. Particles of ˜200 nm dimensions are formed in indents of ˜1 μm dimensions whilst nanoparticles of ˜20 nm are observed in the smallest indents made (˜50 nm). We have also demonstrated patterning of Au by indentation of a Au layer sandwiched between two SiO2 films deposited on Si by plasma-enhanced chemical vapour deposition. Here, cracking of the SiO2 layer occurs allowing Au to diffuse to the surface at the indented locations during post-indentation annealing.

Type
Research Article
Copyright
Copyright © Materials Research Society 2010

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