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OES, LIF, and MS Studies of Silane, Disilane, and Chlorosilane Plasmas

Published online by Cambridge University Press:  28 February 2011

H. U. Lee ,
R. C. Ross  and
J. P. De Neufville
H. U. Lee
Affiliation:
Energy Conversion Devices, Inc., P.O.Box 5357, North Branch, N.J.08876
R. C. Ross
Affiliation:
Energy Conversion Devices, Inc., P.O.Box 5357, North Branch, N.J.08876
J. P. De Neufville
Affiliation:
Energy Conversion Devices, Inc., P.O.Box 5357, North Branch, N.J.08876
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Abstract

Using optical emission spectroscopy (OES), mass spectrometry (MS), and laser-induced fluorescence (LIF), we are investigating a number of glow-discharge reactions as a function of RF power, flow rates, partial pressures, and H2 dilution under realistic thin-film deposition conditions.In this paper we report on the preliminary results of two studies:

  1. 1) The formation of radical and polymeric species in SiH4 and Si2H6 plasmas, and

  2. 2) The characterization of SiF4 + H2 plasmas and the detection of HSiCl and HSiF in the plasmas of SiH2Cl2 and SiH2F2, respectively.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 68: Symposium C – Plasma Processing , 1986 , 149
Copyright
Copyright © Materials Research Society 1986

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References

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