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Raman Spectroscopy of Group IV Nanostructured Semiconductors: Influence of Size and Temperature

Published online by Cambridge University Press:  01 February 2011

Alfredo Torres
Affiliation:
ator@fmc.uva.es, Universidad de Valladolid, Física de la Materia Condensada, Valladolid, Spain
Oscar Martínez
Affiliation:
oscar@fmc.uva.es, Universidad de Valladolid, Física de la Materia Condensada, Valladolid, Spain
Carmelo Prieto
Affiliation:
prieto@fmc.uva.es, Universidad de Valladolid, Física de la Materia Condensada, Valladolid, Spain
Juan Jimenez
Affiliation:
jimenez@fmc.uva.es, United States
Andrés Rodríguez
Affiliation:
andres.rodriguez.dominguez@upm.es, Universidad Politécnica de Madrid, Tecnología Electrónica, Madrid, Spain
Jesús Sangrador
Affiliation:
jsangra@etsit.upm.es, Universidad Politécnica de Madrid, Tecnología Electrónica, Madrid, Spain
Tomás Rodríguez
Affiliation:
tomas@etsit.upm.es, Universidad Politécnica de Madrid, Tecnología Electrónica, Madrid, Spain
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Abstract

Group IV nanostructures have attracted a great deal of attention because of their potential applications in optoelectronics and nanodevices. Raman spectroscopy has been extensively used to characterize nanostructures since it provides non destructive information about their size, by the adequate modeling of the phonon confinement effect. However, the Raman spectrum is also sensitive to other factors, as stress and temperature, which can mix with the size effects borrowing the interpretation of the Raman spectrum. We present herein an analysis of the Raman spectra obtained for Si nanowires; the influence of the excitation conditions and the heat dissipation media are discussed in order to optimize the experimental conditions for reliable spectra acquisition and interpretation.

Type
Research Article
Copyright
Copyright © Materials Research Society 2009

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References

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