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The Micro-Structure and Electron Conduction Mechanism of Hydrogenated Nano-Crystalline Silicon Films

Published online by Cambridge University Press:  28 February 2011

Yuliang He
Affiliation:
The Amorphous Physics Research Laboratory, Beijing University of Aeronautics and Astronautics, Beijing 100083, P.R. China.
Yiming Chu
Affiliation:
Beijing Laboratory of Election Microscopy, Chinese Academy of Sciences, Beijing 100080, P.R. China.
Hongyi Lin
Affiliation:
Department of Electronic Engineering, Beijing Institute of Technology, Beijing 100081, P.R. China.
Guoguang Qin
Affiliation:
department of Physics, Peking University, Beijing 100871, P.R. China.
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Abstract

The hydrogenated nano-crystalline silicon (nc-Si:H) films have been deposited with PECVD method.1–2 The micro-structure of these films has been studied by TEM and HREM. The PECVD nc-Si:H films show fiber texture structure which is exceptional compared with the nano-size materials made by the method of compressing granules method. The fractal dimention of this texture structure has been calculated with a Fourier filtered image. The relationshisps between conductivity and temperature and micro-structure has also been studied and the mechanism of electron conduction is discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

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