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Monte Carlo Simulations of Film Profile Evolution During Nonplanar CVD Processes

Published online by Cambridge University Press:  25 February 2011

Daniel G. Coronell  and
Klavs F. Jensen
Daniel G. Coronell
Affiliation:
Massachusetts Institute of Technology, Department of Chemical Engineering, Cambridge, MA 02139
Klavs F. Jensen
Affiliation:
Massachusetts Institute of Technology, Department of Chemical Engineering, Cambridge, MA 02139
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Abstract

A Monte Carlo simulation approach has been developed to model transport and film profile evolution for rarefied gas flows during nonplanar CVD over trenches and contact holes. A systematic study of the effect of various parameters on the film conformality including intermolecular collisions, reactant sticking coefficient and feature geometry is reported.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 280: Symposium B – Evolution of Surface and Thin Film Microstructure , 1992 , 169
Copyright
Copyright © Materials Research Society 1993

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References

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