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In-Situ Surface Photo-Absorption Study of Movpe Surface

Published online by Cambridge University Press:  22 February 2011

Naoki Kobayashi
Naoki Kobayashi*
Affiliation:
NTT Basic Research Laboratories Atugi-shi, Kanagawa 243-01, Japan
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Abstract

In-situ surface photo-absorption (SPA) method was applied to study the dynamic surface processes and the static surface structures during metal-organic vapor phase epitaxy (MOVPE). Observed spectra in near-ultaviolet and visible regions consist of an anisotropic dielectric response due to surface dimer-bonds as well as an isotropic response probably due to surface back-bonds. Time-resolved spectra showing dynamic changes of surface can be measured by the use of optical multichannel analyzer. The rate of surface decomposition of source molecule was measured as the change of reflectivity at a fixed wavelength. The decomposition of source molecule was characterized quantitatively, and various effects on the decomposition were studied. The style of decomposition and the activation energy depended on the substituent of source molecule and the rate of decomposition was affected by the surface potential and the strain.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 340: Symposium E – Compound Semiconductor Epitaxy , 1994 , 91
Copyright
Copyright © Materials Research Society 1994

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References

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