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Effect of Substrate Surface Structure and Deposition Conditions on the Microstructure of Tin Dioxide Thin Films Synthesized by Femtosecond Pulsed Laser Deposition

Published online by Cambridge University Press:  21 March 2011

J. E. Dominguez ,
L. Fu ,
P. A. Van Rompay ,
Z. Y. Zhang ,
J. A. Nees ,
P. P. Pronko  and
X. Q. Pan
J. E. Dominguez
Affiliation:
Department of Materials Science and Engineering, The University of Michigan, Ann Arbor, MI 48109
L. Fu
Affiliation:
Department of Materials Science and Engineering, The University of Michigan, Ann Arbor, MI 48109
P. A. Van Rompay
Affiliation:
Center for Ultrafast Optical Science and Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109
Z. Y. Zhang
Affiliation:
Center for Ultrafast Optical Science and Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109
J. A. Nees
Affiliation:
Center for Ultrafast Optical Science and Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109
P. P. Pronko
Affiliation:
Center for Ultrafast Optical Science and Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109
X. Q. Pan
Affiliation:
Center for Ultrafast Optical Science and Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109
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Abstract

Tin oxide films were deposited on sapphire and silicon substrates using reactive femtosecond pulsed laser deposition at temperatures ranging from room temperature to 700°C. The effect of electrical discharge and background oxygen pressure on the thin film microstructure was studied. The microstructure of the films was characterized by transmission electron microscopy and x-ray diffraction. SnO2 films fabricated consist of different textures in microstructures that depend on the deposition conditions and substrate surface structures. For instance, films deposited on the (1012) sapphire (R-cut) are amorphous if deposited at room temperature, whereas films deposited at 700°C were epitaxial, single crystalline. Discharge and oxygen pressure had a strong effect on the ion/neutral ratio of the ablated plasma plume of SnO2.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 654: Symposia AA – Structure-Property Relationships of Oxide Surfaces & Interfaces , 2000 , AA3.45.1
Copyright
Copyright © Materials Research Society 2001

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