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Fabrication of Sub-250nm High Aspect Ratio Apertures by Focused Ion Beam Lithography

Published online by Cambridge University Press:  26 February 2011

Todd Simpson  and
Ian V Mitchell
Todd Simpson
Affiliation:
tsimpson@uwo.ca, University of Western Ontario, Physics & Astronomy, 1151 Richmond St, London, N6A2H3, Canada, 519 661 2111 x86977, 519 662 2033
Ian V Mitchell
Affiliation:
i.mitchell@uwo.ca, University of Western Ontario, Physics & Astronomy, 1151 Richmond St, London, N6A3K7, Canada
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Abstract

Aperture arrays were fabricated in 1.0µm thick gold films supported on 20nm thick silicon nitride membranes. Lithographic milling strategies in gold were evaluated through the use of in-situ sectioning and high resolution SEM imaging with the UWO CrossBeam FIB/SEM. A successful strategy for producing a 250nm diameter hole with sidewalls approaching vertical is summarized.

Keywords

ion-solid interactionsAulithography (removal)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 983: Symposium LL – Focused Ion Beams for Analysis and Processing , 2006 , 0983-LL05-06
Copyright
Copyright © Materials Research Society 2007

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References

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