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Ultra-fast photoluminescence in fused silica surface flaws susceptible to laser damage

Published online by Cambridge University Press:  22 August 2011

Ted A. Laurence ,
Jeff D. Bude  and
Nan Shen
Ted A. Laurence
Affiliation:
Condensed Matter and Materials Division, Lawrence Livermore National Laboratory Livermore, CA 94550, U.S.A.
Jeff D. Bude
Affiliation:
Condensed Matter and Materials Division, Lawrence Livermore National Laboratory Livermore, CA 94550, U.S.A.
Nan Shen
Affiliation:
Condensed Matter and Materials Division, Lawrence Livermore National Laboratory Livermore, CA 94550, U.S.A.
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Abstract

Using high-sensitivity confocal time-resolved photoluminescence (PL) techniques, we found an ultrafast PL (40 ps-5 ns) from impurity-free surface flaws on fused silica. This PL is excited by the single-photon absorption of sub-band gap light. Regions which exhibit this PL are strongly absorptive well below the band gap, as evidenced by a propensity to damage with 3.5 eV nanosecond-scale laser pulses. Very high defect densities are needed to explain the damage thresholds observed. For such high defect densities, significant interactions between defects may strongly affect the temporal characteristics of the emission of electronic excitations. We propose that the distribution in lifetimes observed is not simply due to a large variety of defect states, but due to a variety of energy transfer interactions between defect states.

Keywords

laser-induced reactionluminescenceoptical properties
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1365: Symposium TT – Laser-Material Interactions at Micro/Nanoscales , 2011 , mrss11-1365-tt08-04
Copyright
Copyright © Materials Research Society 2011

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References

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