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Some Advantages of EDS Analysis in a 400 KV Electron Microscope

Published online by Cambridge University Press:  25 February 2011

S. Suzuki ,
T. Honda  and
Y. Bando
S. Suzuki
Affiliation:
JEOL Ltd., 1418 Nakagami, Akishima, Tokyo 196, Japan
T. Honda
Affiliation:
JEOL Ltd., 1418 Nakagami, Akishima, Tokyo 196, Japan
Y. Bando
Affiliation:
National Institute for Research in Inorganic Materials, 1 Namiki, Sakura, Niihari, Ibaraki 305, Japan
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Abstract

The dependence of the characteristic and bremsstrahlung X-ray counts, the peak to background (P/B) ratio and the spatial resolution on the incident beam energy between 100 keV and 400 keV were measured using a high voltage electron microscope (HVEM). The bremsstrahlung count decreases much faster than that of the characteristic count with the increase of the incident beam energy. The decrease rate depends on Z number. It is ascertained that the P/B ratio and the spatial resolution at 400 keV were 2 or 3 and 2.5 times better than those at 100 keV, respectively.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 62: Symposium Q – Materials Problem Solving with the Transmission Electron Microscope , 1985 , 123
Copyright
Copyright © Materials Research Society 1986

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References

Refereces

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