Hostname: page-component-8448b6f56d-gtxcr Total loading time: 0 Render date: 2024-04-19T06:05:30.763Z Has data issue: false hasContentIssue false
  • English
  • Français

An Ion Probe Study of Plasma-Assisted Laser Deposition

Published online by Cambridge University Press:  01 January 1992

S. Witanachchi ,
K. Ahmed ,
P. Sakthivel  and
P. Mukherjee
S. Witanachchi
Affiliation:
Department of Physics, University of South Florida, Tampa, FL 33620
K. Ahmed
Affiliation:
Department of Physics, University of South Florida, Tampa, FL 33620
P. Sakthivel
Affiliation:
Department of Physics, University of South Florida, Tampa, FL 33620
P. Mukherjee
Affiliation:
Department of Physics, University of South Florida, Tampa, FL 33620
Get access

Abstract

The ionic content of an excimer laser ablated Yga2Cu3O7−δ (YBCO) plume has been investigated by using an ion probe detection system. The time-of-flight ion signals indicate a bifurcation of the plume, where the degree of bifurcation is dependent on both the oxygen pressure and the laser spot size at the target. A significant enhancement in the ionic content is observed when the plume is passed through a high voltage discharging ring. The results describing the effect of the pressure, laser spot size and the discharge parameters on the propagating laser plume are presented in this paper.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 285: Symposium I – Laser Ablation in Materials Processing–Fundamentals and Applications , 1992 , 51
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Takagi, I., Thin Solid Films, 92, 1 (1982).Google Scholar
2. Green, J. E., CRC Critical Reviews of Solid State and Materials Science 11, 47 (1983).Google Scholar
3. Sankur, H., DeNatale, J., Gunning, W., and Nelson, J. G., J. Vac. Sci. Technol. A5, 2869 (1987).Google Scholar
4. Walkup, R. E., Jasiske, J. M., Dreyfus, R. W., Appl. Phys. Letts. 48, 1960 (1986).Google Scholar
5. Venkatesan, T., Inam, A., Dutta, B., Ramesh, R., Hegde, M. S., Wu, X. D., Nazar, L., Chang, C. C., Barner, J. B., Hwang, D. M. and Rogers, C. T., Appl. Phys. Lett. 56, 391 (1990).Google Scholar
6. Singh, R. K., Narayan, J., Singh, A. K. and Krishnaswamy, J., Appl. Phys. Lett. 54, 2271 (1989).Google Scholar
7. Fork, P. K., Ponce, F. A., Tramontana, J. C., Newman, N., Phillips, J. M., and Gaballe, T. H., Appl. Phys. Lett. 58, 2432 (1991).Google Scholar
8. Koren, G., Gupta, A., Giess, E. A., Segmuller, A. and Laibowitz, R. B., Appl. Phys. Lett. 54, 1054 (1989).Google Scholar
9. Witanachchi, S., Kwok, H. S., Wang, X. W. and Shaw, D. T., Appl. Phys. Lett. 53, 234 (1988).Google Scholar
10. Zheng, J. P., Ying, Q. Y., Witanachchi, S., Huang, Z. Q., and Shaw, D. T., Appl. Phys. Lett. 54, 954 (1989).Google Scholar
11. Weimer, W. A., Appl. Phys. Lett. 52, 2171 (1988).Google Scholar
12. Geohegan, D. B., Appl. Phys. Lett. 60, 2732 (1992).Google Scholar
13. Venkatesan, T., Wu, X. D., Inam, A., Jeon, Y., Croft, M., Chase, E. W., Chang, C. C., Wachtman, J. B., Odom, R. W., di Brozolo, F. R. and Magee, C. A., Appl. Phys. Lett. 53, 1431 (1988).Google Scholar
14. Geohegan, D. B. and Mashburn, D. N., Appi. Phys. Lett. 55, 2345 (1989).Google Scholar
15. Okada, T., Shibamaru, N., Nakayama, Y., and Maeda, M., Appl. Phys. Lett. 60, 941 (1992).Google Scholar
16. Dyer, P. E., Greenough, R. D., Issa, A. and Key, P. H., Appl. Phys. Lett. 53, 534 (1988).Google Scholar
17. Witanachchi, S., Ahmed, K., Sakthivel, P. and Mukherjee, P., to appear in the Proceedings of the Conference on Superconductivity and Applications, NYSIS, 1992.Google Scholar
18. Witanachchi, S., Ahmed, K., Sakthivel, P. and Mukherjee, P., submitted for publication.Google Scholar
19. Brongersma, S. H., Kools, J. C. S., Bailer, T. S., Beijerinck, H. C. W. and Dieleman, J., Appl. Phys. Lett. 59, 1311 (1991).Google Scholar
20. Kools, J. C. S., Brongersma, S. H., van de Riet, E. and Dieleman, J., Applied Physics B, 53, 125 (1991).Google Scholar