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Intrinsic N-Type Modulation Doping in Inp-Based Heterostructures

Published online by Cambridge University Press:  10 February 2011

W.M. Chen
Affiliation:
Department of Physics and Measurement Technology, Linköping University, S-581 83 Linköping, SWEDEN
I.A. Buyanova
Affiliation:
Department of Physics and Measurement Technology, Linköping University, S-581 83 Linköping, SWEDEN
A. Buyanov
Affiliation:
Department of Physics and Measurement Technology, Linköping University, S-581 83 Linköping, SWEDEN
W.G. Bi
Affiliation:
Department of Electrical and Computer Engineering, University of California, La Jolla, CA 92093–0407, USA
C.W. Tu
Affiliation:
Department of Electrical and Computer Engineering, University of California, La Jolla, CA 92093–0407, USA
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Abstract

We propose and demonstrate a new doping approach, i.e. intrinsic doping, for n-type modulation doping in InP-based heterostructures. Instead of the conventional method of n-type doping by shallow donor impurities, grown-in intrinsic defects are utilized to provide the required doping without external doping sources. The success of this approach is clearly demonstrated by our results from InGaAs/InP heterostructures, where the required n-type doping in the InP barriers is provided by Pin antisites, preferably introduced during off-stoichiometric growth of InP at low temperatures (LT-InP) by gas source molecular beam epitaxy. A twodimensional electron gas (2DEG) is shown to be formed near the InGaAs/InP heterointerface as a result of electron transfer from the LT-InP to the InGaAs active layer, from studies of Shubnikov-de Haas oscillations and photoluminescence. The concentration of the 2DEG is determined to be as high as 1.15×1012 cm−2, where two subbands of the 2DEG are readily occupied.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

1. MUller, P., Bachmann, T., Wendler, E. and Wesch, W., J. Appl. Phys. 75, 3814 (1994).Google Scholar
2. Jackson, S.L., Fresina, M.T., Baker, J.E. and Stillman, G.E., Appl. Phys. Lett. 64, 2867 (1994).Google Scholar
3. Wolk, J.A., Walukiewicz, W., Thewalt, M.L.W. and Haller, E.E., Phys. Rev. Lett. 68, 3619 (1992).Google Scholar
4. Liang, B.W., Lee, P.Z., Shih, D.W. and Tu, C.W., Appl. Phys. Lett. 60, 2014 (1992).Google Scholar
5. Dreszer, P., Chen, W.M., Seendripu, K., Wolk, J.A., Walukiewicz, W., Liang, B.W., Tu, C.W. and Weber, E.R., Phys. Rev. B 47, 4111 (1993).Google Scholar
6. Chen, W.M., Dreszer, P., Prasad, A., Kurpiewski, A., Walukiewicz, W., Weber, E.R., Sörman, E., Monemar, B., Liang, B.W. and Tu, C.W., J. Appl. Phys. 76, 600 (1994).Google Scholar
7. Sarkar, C.K., Nicholas, R.J., Portal, J.C., Razeghi, M., Chevrier, J. and Massies, J., J. Phys. C 18, 2667 (1985).Google Scholar
8. Hayes, D.G., Skolnick, M.S., Whittaker, D.M., Simmonds, P.E., Taylor, L.L., Bass, S.J. and Eaves, L., Phys. Rev. B 44, 3436 (1991).Google Scholar
9. Zhang, Yong-Hang, Jiang, De-Sheng, Cingolani, R. and Ploog, K., Appl. Phys. Lett. 56, 2195 (1990).Google Scholar