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Use of Malonic Acid in Chemical-Mechanical Polishing ( CMP ) of Tungsten

Published online by Cambridge University Press:  10 February 2011

L. Zhang  and
S. Raghavan
L. Zhang
Affiliation:
Materials Science & Engineering, University of Arizona, Tucson, AZ 85721, liming@ccit.arizona.edu, raghavan@ccit.arizona.edu
S. Raghavan
Affiliation:
Materials Science & Engineering, University of Arizona, Tucson, AZ 85721, liming@ccit.arizona.edu, raghavan@ccit.arizona.edu
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Abstract

The use of malonic acid as an additive in alumina slurries used for the chemical mechanical polishing ( CMP ) of tungsten has been explored for the reduction of particulate contamination. The principal objective of this work was to delineate conditions under which alumina contamination on polished surfaces could be reduced.

The interaction between malonic acid and alumina particles has been investigated through electrokinetic and adsorption measurements. At suitable malonic acid concentrations and pH values, tungsten and alumina surfaces develop a negative zeta potential resulting in conditions conducive to reduced particulate contamination. Small scale polishing experiments have been carried out to relate electrokinetic results to the level of particulate contamination after polishing.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 477 , 1997 , 115
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Zhang, L. & Raghavan, S., Unpublished report (1996).Google Scholar
2. Raghunath, C., Fundamental Aspects of Particulate Contamination of Tungsten and Thermal Oxide Wafers during Chemical-Mechanical Polishing. Ph.D. dissertation, University of Arizona (1997).Google Scholar
3. Dean, J. A., Lange's Handbook of Chemistry ( 14th ed.), p.8.54. McGraw-Hill, New York (1976).Google Scholar
4. Powell, H. K. J. & Town, R. M., Aust. J. Chem., 46, 721–726 (1993).10.1071/CH9930721CrossRefGoogle Scholar
5. Sillen, L. G. & Martell, A. E., Stability Constants of Metal-Ion Complexes, Supplement No. 1. Special publication No. 25. The Chemical Society (1971).Google Scholar
6. Goedkoop, J. A. & MacGillavry, C. H., Acta Cryst., 10, 125–127 (1957).CrossRefGoogle Scholar
7. Hidber, P. C. et al. , J. Am. Ceram. Soc., 79, 1857–1867 (1996).10.1111/j.1151-2916.1996.tb08006.xCrossRefGoogle Scholar
8. Hefny, M. M. et al. , Indian J. Technol., 26, 395–398 (1988).Google Scholar
9. Kneer, E. et al. , J. Electrochem. Soc., 143, 4095–4100 (1996).10.1149/1.1837342CrossRefGoogle Scholar