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Photoemission Investigation of the Energy Level Alignment at the Rubrene/metal Interface

Published online by Cambridge University Press:  01 February 2011

Huanjun Ding  and
Yongli Gao
Huanjun Ding
Affiliation:
hjding@pas.rochester.edu, university of rochester, department of physics and astronomy, Baush and Lomb Hall Room 8,, department of physics and astronomy,, university of rochester, rochester, NY, 14627, United States, 585-275-8588
Yongli Gao
Affiliation:
ygao@pas.rochester.edu, University of Rochester, Department of Physics and Astronomy, Rochester, NY, 14627, United States
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Abstract

The electronic structure of the interfaces between rubrene and various metals, including Au, Ag, Al, and Ca, have been investigated with photoemission and inverse photoemission spectroscopy. The formation of the interface dipole is observed at all interfaces. The Fermi level shifts linearly within the band gap as a function of metal workfunction, until it is pinned at the lowest unoccupied molecular orbital (LUMO) by Ca. Strong interactions take place at the interface between rubrene and Ca, evidenced by the evolution of the valence features.

Keywords

photoemissionelectronic structureorganic
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1029: Symposium F – Interfaces in Organic and Molecular Electronics III , 2007 , 1029-F04-03
Copyright
Copyright © Materials Research Society 2008

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References

1. Tsumura, A., Koezuka, H., and Ando, T., Appl. Phys. Lett. 49, 1210 (1986).10.1063/1.97417Google Scholar
2. Horowitz, G., Adv. Mater. 10, 365 (1998).Google Scholar
3. Katz, H. E., and Bao, Z., J. Phys. Chem. B 104, 671 (2000).Google Scholar
4. Seo, S., Park, B., and Evans, P. G., Appl. Phys. Lett., 88, 232114 (2004).10.1063/1.2210294Google Scholar
5. Nelson, S. F., Lin, Y. Y., Gundlach, D. J., and Jachson, T. N., Appl. Phys. Lett., 72, 1854 (1998).10.1063/1.121205Google Scholar
6. Choi, J., Lee, K., Hwang, D. K., Jim, J. H., and Im, S., J. Appl. Phys., 100, 116102 (2006).10.1063/1.2396712Google Scholar
7. halik, M., Klauk, H., Zschieschang, U., Schmid, G., Ponomarenko, S., Kirchmeyer, S., and Weber, W., Adv. Mater. 15, 917 (2003).10.1002/adma.200304654Google Scholar
8. Podzorov, V., Menard, E., Borissov, A., Kiryukhin, V., Rogers, J. A., and Gershenson, M. E., Phys. Rev. Lett., 93, 086602 (2004).Google Scholar
9. Wang, L., Chen, S., Liu, L., Qi, D., Gao, X., and Wee, A., Appl. Phys. Lett. 90, 132121 (2007).10.1063/1.2719033Google Scholar
10. Namatame, H., Tamura, M., Nakatake, M., Sto, H., Ueda, Y., Taniguchi, M., and Fujisawa, M., J. Electron Spectrosc. Relat. Phenom. 80, 393 (1996).10.1016/0368-2048(96)03000-9Google Scholar
11. Watkins, N. J., Yan, L., Gao, Y., Appl. Phys. Lett. 80, 4384 (2002).10.1063/1.1485129Google Scholar
12. Ochs, D., Braun, B., Maus-Friedrichs, W., Kempter, V., Surf. Sci. 417, 406 (1998).10.1016/S0039-6028(98)00721-3Google Scholar