Hostname: page-component-8448b6f56d-wq2xx Total loading time: 0 Render date: 2024-04-16T08:29:06.675Z Has data issue: false hasContentIssue false
  • English
  • Français

Gas Phase Decomposition of an Organometallic Chemical Vapor Deposition Precursor to AIN:[AI(CH3)2NH2]3

Published online by Cambridge University Press:  21 February 2011

Carmela C. Amato ,
John B. Hudson  and
Leonard V. Interrante
Carmela C. Amato
Affiliation:
Rensselaer Polytechnic Institute, Dept. of Chemistry, Troy, NY 12180
John B. Hudson
Affiliation:
Rensselaer Polytechnic Institute, Dept. of Materials Engineering, Troy, NY 12180
Leonard V. Interrante
Affiliation:
Rensselaer Polytechnic Institute, Dept. of Chemistry, Troy, NY 12180
Get access

Abstract

A novel technique for probing chemical vapor deposition reaction mechanisms is presented. A conventional hot-wall Pyrex reactor is coupled to a molecular beam apparatus. Preliminary results of the decomposition of an organometallic precursor to AIN, [AI(CH3)2NH2]3, indicate a decomposition temperature between 200 and 270°C. The mass spectrum of the precursor at 100°C provides evidence for the existence of a trimer-dimer equilibrium of the precursor at this temperature

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989 , 119
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Stringfellow, G.B., Organometallic Vapor Phase Epitaxy: Theory and Practice, (Academic Press, Inc., Boston, MA 1989), p.1.Google Scholar
2.Messier, R., MRS Bulletin 13, 11, 18 (1988).Google Scholar
3. (a)Lee, F., Backman, A.L., Lin, R., Gow, T.R. and Masel, R.I., Surface Science 216, 173 (1989). (b)B.E. Bent, R.G. Nuzzo and L.H. Dubois, J. Am. Chem. Soc. 111, 1634 (1989),Google Scholar
4.Interrante, L.V., Carpenter, L.E., Whitmarsh, C., Lee, W., Garbauskas, M. and Slack, G.A. in Better Ceramics Through Chemistry III, edited by (Maters. Res. Soc. Proc. 73, Pittsburgh, PA 1988) pp. 359–366.Google Scholar
5.Interrante, L.V., Sigel, G.A., Garbauskas, M., Hejna, C. and Slack, G.A., Inorg. Chem. 28, 252 (1989).Google Scholar
6.Interrante, L.V., Lee, W., McConnell, M., Lewis, N. and Hall, E., J. Electrochem. Soc. 136, 472 (1989).Google Scholar
7.Sauls, F.C., Czekaj, C.L. and Interrante, L.V., submitted for publication.Google Scholar