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Recent Advances in FIB Technology for Nano-prototyping and Nano-characterisation

Published online by Cambridge University Press:  01 February 2011

Debbie J Stokes ,
Laurent Roussel ,
Oliver Wilhelmi ,
Lucille A Giannuzzi  and
Dominique HW Hubert
Debbie J Stokes
Affiliation:
Debbie.Stokes@fei.com, FEI Company, Building AAE, PO BOX 80066, Eindhoven, 5600, Netherlands, +447920711972
Laurent Roussel
Affiliation:
Laurent.Roussel@fei.com, FEI Company, Eindhoven, 5600, Netherlands
Oliver Wilhelmi
Affiliation:
Oliver.Wilhelmi@fei.com, FEI Company, Eindhoven, 5600, Netherlands
Lucille A Giannuzzi
Affiliation:
Lucille.Giannuzzi@fei.com, FEI Company, Hillsboro, OR, 97124, United States
Dominique HW Hubert
Affiliation:
Dominique.Hubert@fei.com, FEI Company, Eindhoven, 5600, Netherlands
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Abstract

Combined focused ion beam (FIB) and scanning electron microscopy (SEM) methods are becoming increasingly important for nano-materials applications as we continue to develop ways to exploit the complex interplay between primary ion and electron beams and the substrate, in addition to the various subtle relationships with gaseous intermediaries.

We demonstrate some of the recent progress that has been made concerning FIB SEM processing of both conductive and insulating materials for state-of-the-art nanofabrication and prototyping and superior-quality specimen preparation for ultra-high resolution scanning transmission electron microscopy (STEM) and transmission electron microscopy (TEM) imaging and related in situ nanoanalysis techniques.

Keywords

nanostructureion-beam processingnanoscale
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1020: Symposium GG – Ion-Beam-Based Nanofabrication , 2007 , 1020-GG01-05
Copyright
Copyright © Materials Research Society 2007

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References

1. Wilhelmi, O., Reyntjens, S., Roussel, L., J., Stokes D. and Hubert, D.H.W. High Resolution Nanolithography using Focused Ion Beam Scanning Electron Microscopy (FIB SEM). (Manuscript in preparation).Google Scholar
2. Morrissey, F., Reyntjens, S, Nakahara, K and Jiao, C., Methods for Structuring and Prototyping on a Nanoscale Using a DualBeam. Microsc. Microanal., 2005. 11(Suppl 2)Google Scholar
3. Anzalone, P.A., Mansfield, J.F. and Giannuzzi, L.A., DualBeam Milling and Deposition of Complex Structures Using Bitmap Files and Digital Patterning. Microsc. Microanal., 2004. 10 (Suppl 2): p. 1154–1155.Google Scholar
4. Stokes, D.J, Vystavel, T and Morrissey, F (2006) Focused Ion Beam (FIB) Milling of Electrically Insulating Specimens Using Simultaneous Primary Electron and Ion Beam Irradiation. Journal of Physics D: Applied Physics, 40, 874–877.Google Scholar
5. Galtrey, M.J., Oliver, R.A., Kappers, M.J., Humphreys, C.J., Stokes, D.J., Clifton, P.H. and Cerezo, A (2007) Three Dimensional Atom Probe Studies of an InxGa1-xN/GaN Multiple Quantum Well Structure: Assessment of Possible Indium Clustering. Applied Physics Letters 90 (6).Google Scholar
6. Giannuzzi, L.A., Guerts, R. and Ringnalda, J, 2 kV Ga+ FIB milling for reducing amourphous damage in silicon. Microsc. Microanal., 2005. 11(Suppl 2): p. 828–829.Google Scholar
7. Kujawa, S., Freitag, B. and Hubert, D.H.W., An aberration Corrected (S)TEM Microscope for Nanoresearch. Microscopy Today, July 2005: p. 16–21.Google Scholar
8. Hubert, , DHW (2007) International Lab News.Google Scholar
9. Kato, N.I. et al. , J. Vac. Sci. Technol. A 17(4) (1999) 1201.Google Scholar
10. Jinschek, J.R. et al. , Microsc. Microanal., 10(supp 2) (2004) 1142.Google Scholar
11. Langford, R.M. and Petford-Long, A.K., J.Vac.Sci.Technol., A 19(3) (2001) 982.Google Scholar