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Influence of Structure on the Soft X-Ray Optical Properties of Metallic Multilayers

Published online by Cambridge University Press:  15 February 2011

J. M. Slaughter ,
Patrick A. Kearney  and
Charles M. Falco
J. M. Slaughter
Affiliation:
Physics Department and Optical Sciences Center, The University of Arizona, Tucson, AZ 85721
Patrick A. Kearney
Affiliation:
Physics Department and Optical Sciences Center, The University of Arizona, Tucson, AZ 85721
Charles M. Falco
Affiliation:
Physics Department and Optical Sciences Center, The University of Arizona, Tucson, AZ 85721
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Abstract

Multilayer thin film structures for reflecting soft x-rays are now being fabricated in a number of laboratories. However, understanding of. the optical properties of these structures is presently limited by lack of knowledge of the microstructure of the layers, as well as of the details of the interfaces. In this paper we present results from our studies of multilayers grown by molecular beam epitaxy (MBE), characterized in situ by reflection high energy electron diffraction (RHEED), low energy electron diffraction (LEED), Auger, and x-ray photoelectron spectroscopy (XPS), and characterized ex situ by scanning tunneling microscopy (STM), transmission electron microscopy (TEM), x-ray diffraction, and Rutherford back scattering (RBS). In the case of Mo/Si multilayers, we observe the formation of an amorphous interfacial silicide, which can have a positive effect on the performance of these evaporated multilayer mirrors. We observe a contraction in the period of these multilayers as the deposition temperature is raised from 50 °C to 250 °C, corresponding to an increase in the thickness of the interfacial silicide. This contraction indicates that the silicide is more dense than the average atomic density of its components. We also discuss Ag/B and Pd/B multilayers, which have very similar theoretical performance. However, due to differences in the multilayer structures formed, the actual performance of multilayers made from these materials is radically different. The structural differences originate from different growth modes for Ag and Pd on B.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 229: Symposium Q – Structure/Property Relationships for Metal/Metal Interfaces , 1991 , 103
Copyright
Copyright © Materials Research Society 1991

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References

1. Shealy, D.L., Hoover, R.B., Barbee, T.W. Jr. and Walker, A.B.C. Jr., Opt. Eng. 29(7), 721–727 (1990).CrossRefGoogle Scholar
2. Sayre, D., Kirz, J., Feder, R., Kim, D.M. and Spiller, E., Science, 196(4296), 1339–1340 (1977).Google Scholar
3. Walker, A.B.C. Jr., Lindblom, J.F., Timothy, J.G., Barbee, T.W. Jr., Hoover, R.B. and Tandberg-Hanssen, E., Opt. Eng., 29(7), 698–710 (1990).CrossRefGoogle Scholar
4. Hawryluk, A.M. and Seppala, L.G., J. Vac. Sd. Technol. B, 6(6), 2162–2166 (1988).Google Scholar
5. Anderson, E.H., in X-Ray/EUV Optics for Astronomy and Microscopy, edited by Hoover, R.B., (Proc. SPIE 1160, Bellingham, WA 1989) pp. 2–11.Google Scholar
6. Michette, A.G., Optical Systems for Soft X-Rays, (Plenum, New York, NY 1986), p. 165.Google Scholar
7. Slaughter, J.M., Burkland, M.K., Kearney, P.A., Lampis, A.R., Milanovic, Z., Schulze, D.W., Roberts, J.R., Kerner, J., Saloman, E.B. and Falco, C.M., X-Ray/EUV Optics for Astronomy and Microscopy edited by Hoover, Richard B. (Proc. SPIE 1160, Bellingham, WA 1989) pp. 235–244.Google Scholar
8. Ogura, S., Niibe, M., Watanabe, Y., Hayashida, M. and lizuka, T., X-Ray Multilayers for Diffractometers, Monochromators, and Spectrometers edited by Christensen, Finn E., (Proc. SPIE 984 Bellingham, WA 1988) pp. 140–148.Google Scholar
9. Rosenbluth, A.E. and Forsyth, J.M. in Low energy x-ray diagnostics, edited by Attwood, D.T. and Henke, B.L. (AlP proceedings 75, New York, NY 1981) pp. 280–285.Google Scholar
10. Spiller, E., Opt. Eng., 29(6), 609–613 (1990).Google Scholar
11. Freund, A. K., de Bergevin, F., Marot, G., Riekel, C., Susini, J., Zhang, L., and Ziegler, E., Optical Engineering 29(8), 928–941 (1990).Google Scholar
12. Barbee, T.W. Jr., Mrowka, S., and Hettrick, M.C., Applied Optics 24(6), 883–886 (1985).Google Scholar
13. Kearney, P.A., Slaughter, J.M. and Falco, C.M. in X-Ray/EUV Optics for Astronomy, Microscopy. Polarimetry and Projection Lithography edited by Hoover, R.B. and Walker, A.B.C. Jr. (Proceedings SPIE 1343, Bellingham, WA 1990) pp. 25–31.Google Scholar
14. Beckmann, P. and Spizzichino, A., The Scattering of Electromagnetic Waves from Rough Surfaces (Pergamon, Oxford, 1963).Google Scholar
15. James, R. W., The Optical Principles of the Diffraction of X-Rays (Ox Bow press, Woodbridge, Conn. 1982) p. 22.Google Scholar
16. Spiller, Eberhard and Rosenbluth, Alan E., Optical Engineering 2, 954 (1986).Google Scholar
17. Vidal, B. and Vincent, P., Applied Optics 23, 1794 (1984).Google Scholar
18. Henke, B.L., Davis, J.C., Gullikson, E.M. and Perera, R.C.C., A preliminary report on x-ray photoabsorption coefficients and atomic scattering factors for 92 elements in the 10-10,000 eV region LBL-26259 UC-411 (Center for X-Ray Optics, Lawrence Berkeley Laboratory, Berkeley, CA Nov, 1988), and to be published in Atomic Data and Nuclear Data Tables.Google Scholar
19. Sevenhans, W., Gijs, M., Bruynseraede, Y., Homma, H. and Schuller, I.K., Phys. Rev. B 3, pp. 5955–5958 (1986).Google Scholar
20. Locquet, J.P., Neerinck, D., Stockman, L., Bruynseraede, Y. and Schuller, I.K., Phys. Rev. B 39 pp. 13338–13343 (1989).Google Scholar
21. Fullerton, E.E., Vanderstraeten, H., Bruynseraede, Y. and Schuller, I.K., Phys. Rev., to be published.Google Scholar
22. Steams, D.G., J. Appl. Phys. 65, 491 (1989).Google Scholar
23. Perkin Elmer Physical Electronics, Eden Prairie, MN, USA.Google Scholar
24. Inficon Leybold-Heraeus, Inc., East Syracuse, NY, USA.Google Scholar
25. Schulze, Dean W., Slaughter, J. M. and Falco, Charles M., in X-Ray Multilayers for Diffractometers, Monochromators, and Spectrometers edited by Christensen, Finn E. (Proc. SPIE 984, Bellingham, WA, 1988) pp.75–81.Google Scholar
26. Model RVL 8–120, Princeton Research Instruments, Princeton, NJ, USA.Google Scholar
27. Slaughter, J.M., Kearney, P.A., Schulze, D.W., Falco, C.M., Hills, C.R., Saloman, E.B. and Watts, R.N., in X-Ray/EUV Optics for Astronomy, Microscopy. Polarimetry and Projection Lithography edited by Hoover, R.B. and Walker, A.B.C. Jr. (Proc. SPIE 1343, Bellingham, WA 1990). pp. 73–82.Google Scholar