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Development of Novel Nickel(β-Diketonate)2.Ligand Complexes as Precursors for Mocvd of Nickel and Nickel Oxide

Published online by Cambridge University Press:  10 February 2011

Carel I.M.A. Spee
Affiliation:
TNO – Institute of Applied Physics, Department of Inorganic Materials Chemistry, P.O.Box 595, 5600 AN Eindhoven, The Netherlands
Hans L. Linden
Affiliation:
TNO – Institute of Applied Physics, Department of Inorganic Materials Chemistry, P.O.Box 595, 5600 AN Eindhoven, The Netherlands
Adri Mackor
Affiliation:
TNO – Institute of Applied Physics, Department of Inorganic Materials Chemistry, P.O.Box 595, 5600 AN Eindhoven, The Netherlands
Klaas Timmer
Affiliation:
TNO – Institute of Applied Physics, Department of Inorganic Materials Chemistry, P.O.Box 595, 5600 AN Eindhoven, The Netherlands
Harry A. Meinema
Affiliation:
TNO – Institute of Applied Physics, Department of Inorganic Materials Chemistry, P.O.Box 595, 5600 AN Eindhoven, The Netherlands
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Abstract

Volatile and thermally stable nickel complexes have been prepared by the reaction of fluorine substituted, nickel β–diketonates with neutral (poly)oxygen and (poly)nitrogen donor ligands.

These complexes, which have low melting points, have been applied as precursors in MOCVD experiments directed on nickel and nickel oxide deposition. Investigations into the deposition of NiO in porous YSZ via particle precipitation MOCVD, for the development of an anode for a planar Solid Oxide Fuel Cell, are reported.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

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