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3-D Integration Latest Developments at LETI

Published online by Cambridge University Press:  26 February 2011

Barbara Charlet*
Affiliation:
barbara.charlet@cea.fr, CEA, LETI/DIHS, 17, rue des Martyrs, Grenoble, 38054, France, +33438784757, +33438782434
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Abstract

We review the latest 3-D integration developments performed in LETI, giving some devices integration examples and discussing the achieved performances. Direct bonding and layer transfer (smart cut™) is now largely used to process innovative substrates like: SOI, SSOI, GeOI, … and others. This type of new substrate can play a crucial role in 3D structure integration and can answer the requirements for new challenging performances.

3-D integration approach has been used and will be presented in the following topics: advanced packaging by neo-wafers, chip to wafers integration, hetero-structures integration and wafer to wafer concept (front and back-end application). The examples of neo-wafer rebuilding for advanced packaging, the hetero- structure achieved by chip-to-wafer or wafer-to-wafer bonding and front-end and back-end architecture are discussed regarding the 3-D integration challenging requirements. The challenging cases of wafer-level integrated demonstrators for high density 3D inter-chips connections and wireless interconnections are presented. For some examples we give also the first electrical performances achieved with representative demonstrators.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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References

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