Hostname: page-component-76fb5796d-vfjqv Total loading time: 0 Render date: 2024-04-25T21:04:20.204Z Has data issue: false hasContentIssue false

Features of Electronic Transport in relaxed Si/Si1-XGeX Heterostructures with High doping level

Published online by Cambridge University Press:  05 March 2013

Lev K. Orlov
Affiliation:
Institute for Physics of Microstrucrures, Russian Academy of Sciences, Nizhny Novgorod, Russia Nizhny Novgorod State Technical University, Nizhny Novgorod, Russia
A. A. Mel’nikova
Affiliation:
Nizhny Novgorod State Technical University, Nizhny Novgorod, Russia
Mikhail L. Orlov
Affiliation:
Institute for Physics of Microstrucrures, Russian Academy of Sciences, Nizhny Novgorod, Russia
Natal’ya A. Alyabina
Affiliation:
Nizhny Novgorod Lobachevsky University, Nizhny Novgorod, Russia
Natal’ya L. Ivina
Affiliation:
Nizhny Novgorod Lobachevsky University, Nizhny Novgorod, Russia
V. N. Neverov
Affiliation:
Institure for Physics of Metals, Russian Academy of Sciences, Yekaterinburg, Russia,
Zsolt J. Horváth
Affiliation:
Óbuda University, Kandó Kálmán Faculty of Electrical Engineering, Institute of Microelectronics and Technology, Budapest, Hungary Institute of Technical Physics and Materials Science, Research Centre for Natural Sciences, Hungarian Academy of Sciences, Budapest, Hungary
Get access

Abstract

Papers in the Appendix were published in electronic format as Volume 1534

Type
Articles
Copyright
Copyright © Materials Research Society 2013 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Halstedt, J., von Haartman, M., Hellstrom, P. E., Ostling, M., Radamsson, H. H.. “Hole mobility in ultrathin body SOI pMOSFETs with SiGe or SiGeC channel”, IEEE EDL, 27, 466 (2006).CrossRefGoogle Scholar
Hull, R., Bean, J. C., Werder, D. J., Leibenguth, R.E., “In situ observations of misfit dislocation propagation in GeSi/Si(100) heterostructures”, Appl. Phys. Lett., 52, 1605 (1988).CrossRefGoogle Scholar
Olshanetsky, E. B., Renard, V., Kvon, Z. D., Portal, J. C., Woods, N. J., Zhang, J., Harris, J. J., “Conductivity of a two-dimensional electron gas in a Si/SiGe heterostructure near the metal-insulator transition: Role of the short- and long-range scattering potential”, Phys. Rev. B., 68, 085304 (2003).CrossRefGoogle Scholar
Yugova, T. G., Vdovin, V. I., Milvidskii, M. G., Orlov, L. K., Tolomasov, V. A., Potapov, A. V., Abrosimov, N. V., “Dislocation pattern formation in epitaxial structures based on SiGe alloys”/ Thin Solid Films, 336, 112 (1998).CrossRefGoogle Scholar
Orlov, L. K., Horvath, Z. J., Orlov, M. L., Lonchakov, A. T., Ivina, N. L., Dobos, L., “Anomalous electrical properties of Si/Si1-xGex heterostructures with an electron transport channel in Si layers”, Physics of the Solid State, 50, 330, (2008).CrossRefGoogle Scholar
Orlov, M. L., Orlov, L. K., “Mechanisms of negative resistivity and generation of terahertz radiation in a short-channel InGaAs/InAlAs transistor”, Semiconductors, 43, 652 (2009).CrossRefGoogle Scholar
Rieger, M. M., Vogl, P., “Electronic-band parameters in strained Si1-xGex alloys on Si1-yGey substrates”, Phys. Rev. B, 48, 14276 (1993).CrossRefGoogle ScholarPubMed
Orlov, L. K., Horvath, Z. J., Potapov, A. V., Orlov, M. L., Ivin, S. V., Vdovin, V. I., Steinman, E. A., Phomin, V. M., “Electrical characteristics and the energy band diagram of the isotype n-SiGe/n-Si heterojunction in relaxed structuresPhysics of the Solid State, 46, 2139 (2004).CrossRefGoogle Scholar