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Spatial Ordering of As Clusters Due to Indium Delta-Doping of LTMBE GaAs

Published online by Cambridge University Press:  10 February 2011

N. A. Bert
Affiliation:
Ioffe Physical-Technical Institute, St.Petersburg 194021, Russia
V. V. Chaldyshev
Affiliation:
Ioffe Physical-Technical Institute, St.Petersburg 194021, Russia
N. N. Faleev
Affiliation:
Ioffe Physical-Technical Institute, St.Petersburg 194021, Russia
A. E. Kunitsyn
Affiliation:
Ioffe Physical-Technical Institute, St.Petersburg 194021, Russia
V. V. Tret'yakov
Affiliation:
Ioffe Physical-Technical Institute, St.Petersburg 194021, Russia
D. I. Lubyshev
Affiliation:
Institute of Semiconductor Physics, Novosibirsk 630090, Russia
V. V. Preobrazhenskii
Affiliation:
Institute of Semiconductor Physics, Novosibirsk 630090, Russia
B R. Semyagin
Affiliation:
Institute of Semiconductor Physics, Novosibirsk 630090, Russia
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Abstract

We have shown that two-dimensional layers of arsenic nano-clusters separated by cluster-free GaAs matrix can be formed using indium delta-doping of GaAs films grown by molecular beam epitaxy at low (200°C) temperature. Spatially ordered structures of As clusters have been obtained in the epitaxial LT GaAs films doped with Si donors, Be acceptors and undoped as well.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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