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Misfit Dislocation Nucleation and Interactions at GexSi1-x/Si Interfaces

Published online by Cambridge University Press:  28 February 2011

D.D. Perovic
Affiliation:
Dept. of Metallurgy and Materials Science, University of Toronto, Toronto, Canada M5S 1A4.
G.C. Weatherly
Affiliation:
Dept. of Metallurgy and Materials Science, University of Toronto, Toronto, Canada M5S 1A4.
D.C. Houghton
Affiliation:
Division of Physics, National Research Council of Canada, Ottawa, Canada K1A OR6.
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Abstract

In the study of elastic strain relaxation in semiconductor heterostructures, a number of misfit dislocation generation mechanisms have been suggested to account for the high interfacial dislocation density observed in these almost defect-free crystals. Several MBE-grown GexSi1-x/Si heterostructures, both in the as-grown and annealed condition have been studied using transmission electron microscopy. The results indicate that some of the popular theories of dislocation generation are less important or not applicable based on both theoretical and experimental considerations. Specifically, it will be shown that: (i) heterogeneous sources play a dominant role in the nucleation mechanisms, (ii) the strain relaxation behaviour during MBE growth may be different from that observed in metastable structures annealed after growth and (iii) the Hagen-S trunk multiplication mechanism is inoperative under most conditions in this system.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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