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Rheed Study of the Surface Structure of Cu(110) From 153 To 973 K

Published online by Cambridge University Press:  22 February 2011

Da-Zhong Liao ,
Y. Cao  and
P. A. Montano
Da-Zhong Liao
Affiliation:
Department of Physics, West Virginia University, Morgantown, WV
Y. Cao
Affiliation:
Department of Physics, Brooklyn College of CUNY, Brooklyn, NY
P. A. Montano
Affiliation:
Argonne National Laboratory, Argonne IL.
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Abstract

We have studied the surface structure of Cu(110) from 153 to 973 K. Reflection high energy electron diffraction (RHEED) was employed to analyze the surface modifications taken place at the crystal surface. We performed careful spot profile intensity measurements as a function of temperature.The typical characteristics of forward scattering, the short wavelength at high energy, and the small grazing incidence angle in RHEED provide strong surface sensitivity and are therefore ideal to study surface structures and especially surface roughness. We observe at low temperatures strong diffraction streaks in the patterns as well as Kikuchi lines. The diffraction intensities reduce slowly when the temperature is raised from 153 K to 473 K, then fall off more rapidly after that, and from 573 K, the intensities decrease drastically. High resolution LEED measurements indicate a reduction in the coherence length at high temperatures.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 208: Symposium J – Advances in Surface and Thin Film Diffraction , 1990 , 35
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

[1] den Nijs, M., Riedel, E.K., Conrad, E.H. and Engel, T., Phys. Rev. Lett. 55 (1985) 1689, 57 (1986) 1279(E).Google Scholar
[2] Frenken, J.W.M., Maree, P.M.J. and van der Veen, J.F., Phys. Rev. B34 (1986) 7506.CrossRefGoogle Scholar
[3] Lapujoulade, J., Perreau, J. and Kara, A., Surface Sci. 129 (1983) 59.Google Scholar
[4] Mochrie, S.G.J., Phys. Rev. Lett. 59 (1987) 304.Google Scholar
[5] Ocko, B.M. and Mochrie, S.G.J., Phys. Rev. B38 (1988) 7278.Google Scholar
[6] Zeppenfeld, P., Kern, K., David, R. and Comsa, G., Phys. Rev. Lett. 62 (1989) 63.CrossRefGoogle Scholar
[7] Cao, Y. and Conrad, E.H., Phys. Rev. Lett. 64 (1990) 447.Google Scholar
[8] Conrad, E.H., Allen, L.R., Blanchard, D.L. and Engel, T., Surface Sci. 187 (1987) 265; 198 (1988) 207.CrossRefGoogle Scholar
[9] Bolger, B., Larsen, P.K. and Ehmsen, G.M., in: Reflection High-Energy Electron Diffraction and Reflection Electron Imaging of Surfaces, Eds. Larsen, P.K. and Dobson, P.J. (Plenum, New York, 1988).Google Scholar
[10] Frenken, J.W.M., Huussen, J. and van der Veen, J.F., Phys. Rev. Lett. 58 (1987) 401.Google Scholar
[11] Jayanthi, C.S., Tosatti, E. and Pietronero, L., Phys. Rev. B31 (1985) 3456.Google Scholar
[12] Gorse, D. and Lapujoulade, J., Surface Sci. 162 (1985) 847.Google Scholar
[13] Villain, J., Grempel, D.R. and Lapujoulade, J., J. Phys. F 15 (1985) 809.Google Scholar
[14] Marcano, J., Darici, Y., Min, H., Yin, Y. and Montano, P.A., Surface Sci. 217 (1989) 1.CrossRefGoogle Scholar
[15] Held, G.A., Jordan-Sweet, J.L., Horn, P.M., Mak, A. and Birgeneau, R.J., Phys. Rev. Lett. 59 (1987) 2075.Google Scholar