Hostname: page-component-8448b6f56d-gtxcr Total loading time: 0 Render date: 2024-04-18T19:52:44.914Z Has data issue: false hasContentIssue false

Composition and Functional Properties of Organosilicon Plasma Polymers from Hexamethyldisiloxane and Octamethylcyclotetrasiloxane

Published online by Cambridge University Press:  17 March 2011

Lenka Zajickova
Affiliation:
Department of Physical Electronics, Masaryk University, Faculty of Science, Kotlarska 2, Brno, 61137, Czech Republic
Zuzana Kucerova
Affiliation:
Department of Physical Electronics, Masaryk University, Faculty of Science, Kotlarska 2, Brno, 61137, Czech Republic
Vilma Bursikova
Affiliation:
Department of Physical Electronics, Masaryk University, Faculty of Science, Kotlarska 2, Brno, 61137, Czech Republic
Daniel Franta
Affiliation:
Department of Physical Electronics, Masaryk University, Faculty of Science, Kotlarska 2, Brno, 61137, Czech Republic
Vratislav Perina
Affiliation:
Institute of Nuclear Physics, Academy of Sciences of the Czech Republic, Rez, 25068, Czech Republic
Anna Mackova
Affiliation:
Institute of Nuclear Physics, Academy of Sciences of the Czech Republic, Rez, 25068, Czech Republic
Get access

Abstract

Hybrid organic-inorganic thin films with different fractions of silicon oxide were deposited in rf capacitively coupled discharges using pure hexamethyldisiloxane (HMDSO), octamethylcyclotetrasiloxane (D4) or 5 % HMDSO in O2. The deposition in continuous wave (cw) mode was compared with pulsed conditions under which the discharge on-time was 5 ms and the off-time varied from 0.5 to 15 ms. The chemical composition of the films was studied by FTIR, RBS and ERDA. Their optical properties in UV / visible / NIR were determined from spectroscopic ellipsometry and reflectance measurements fitted with a Kramers-Kronig consistent dispersion model based on a parametrization of density of states. Film hardness and reduced modulus were determined from depth sensing indentation tests.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Judeinstein, P. and Sanchez, C., J. Mater. Chem. 6, 511 (1996).Google Scholar
2. Yu, Y.-Y, Chen, C.-Y., Chen, W.-C., Polymer 44, 593 (2003).Google Scholar
3. Sunkara, H. B., Jethmalani, J. M. and Ford, W. T., Chem. Mater. 6, 362 (1994).Google Scholar
4. Qureshi, N., Meagher, M.M. and Hutkins, R.W., J. Membr. Sci. 158, 115 (1999).Google Scholar
5. Guizard, C., Bac, A., Barboiu, M. and Hovnanian, N., Separ. Purif. Technol. 25, 167 (2001).Google Scholar
6. Grandi, S., Magistris, A., Mustarelli, P., Quartarone, E., Tomasi, C. and Meda, L., J. Non-Cryst. Solids 352, 273 (2006).Google Scholar
7. Sano, K. and Hayashi, S., Thin Solid Films 281–282, 397 (1996).Google Scholar
8. Wrobel, A. M. and Wertheimer, M. R., Plasma-Polymerized Organosilicones and Organometallics“, Plasma Deposition, Treatment and Etching of Polymers, ed. d'Agostino, R. (Academic Press, 1990) pp. 163268.Google Scholar
9. Zajíčková, L., Buršíková, V., Kučerová, Z., Franta, D., Dvořák, P., Šmíd, R., Peřina, V. and Macková, A., Plasma Sources Sci. Technol. 16, S123 (2007).Google Scholar
10. Zajíčková, L., Subedi, D. P., Buršíková, V. and Veltruská, K., Acta Physica Slovaca 53, 489W (2003).Google Scholar
11. Franta, D., Ohlídal, I., Frumar, M. and Jedelský, J., Appl. Surf. Sci. 212–213, 116 (2003).Google Scholar
12. Anderson, D. R., In: Analysis of Silicones, ed. Smith, A. L., chap. 10 p. 247. Wiley-Interscience, New York (1974).Google Scholar
13. Rau, C. and Kulisch, W., Thin Solid Films 249, 28 (1994).Google Scholar
14. Zajíčková, L., Buršíková, V., Franta, D., Bousquet, A., Granier, A., Goullet, A. and Buršík, J., Plasma Processes and Polymers (2007), doi:10.1002/ppap.200730802 (in press).Google Scholar
15. Kim, M. T., Thin Solid Films 311, 157 (1997).Google Scholar