Hostname: page-component-8448b6f56d-xtgtn Total loading time: 0 Render date: 2024-04-24T14:03:55.840Z Has data issue: false hasContentIssue false
  • English
  • Français

Characterization of Spectral Emissions from Laser Irradiated Titanium

Published online by Cambridge University Press:  01 February 2011

Ravindra Kumar Akarapu ,
Puneit Dua ,
Alan Campbell ,
Dana Scott ,
Abdalla Nassar ,
Judith Todd  and
Stephen Copley
Ravindra Kumar Akarapu
Affiliation:
rxa186@psu.edu, The Pennsylvania State University, Engineering Science and Mechanics, 212 Earth and Engineering Sciences Building, University Park, PA, 16802, United States
Puneit Dua
Affiliation:
pud11@psu.edu, The Pennsylvania State University, University Park, PA, 16802, United States
Alan Campbell
Affiliation:
arc5046@psu.edu, The Pennsylvania State University, University Park, PA, 16802, United States
Dana Scott
Affiliation:
dms541@psu.edu, The Pennsylvania State University, University Park, PA, 16802, United States
Abdalla Nassar
Affiliation:
arn5000@psu.edu, The Pennsylvania State University, University Park, PA, 16802, United States
Judith Todd
Affiliation:
jtodd@engr.psu.edu, The Pennsylvania State University, University Park, PA, 16802, United States
Stephen Copley
Affiliation:
smc21@psu.edu, The Pennsylvania State University, University Park, PA, 16802, United States
Get access

Abstract

Titanium nitride (TiN) is a candidate material for hard and wear resistant coatings on metallic substrates such as titanium (Ti), stainless steel and aluminum. Coating processes include chemical vapor deposition, ion implantation, plasma and thermal nitriding under vacuum and controlled environments. The motivation for the present research is to develop a laser plasma process for high rate formation of TiN coatings on Ti substrates at near-atmospheric pressures. Laser induced plasma generated by a pulsed CO2 laser was used to excite a Ti substrate. The species in the vapor plume were characterized by optical emission spectroscopy. Spatially and temporally resolved spectral characterization was performed as a function of laser power, position of the substrate relative to the focal plane, pulse parameters, and shielding gases. These experiments are a first step in understanding laser assisted plasma deposition of nitride/oxy-nitride coatings on titanium metal under atmospheric conditions. Results indicate a window of optimal process parameters for developing titanium nitride coatings.

Keywords

laser-induced reactionTinitride
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1040: Symposium Q – Nitrides and Related Bulk Materials , 2007 , 1040-Q08-02
Copyright
Copyright © Materials Research Society 2008

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Fridman, A., Kennedy, L. A., Plasma Physics and Engineering, (Taylor and Francis group, London, 2004)10.1201/9781482293630Google Scholar
2. Venugopalan, M., Reactions under Plasma Conditions, (Weily Intescience, Newyork, 1971)Google Scholar
3. Lieberman, M. A., Lichtenberg, A.J., Principles of Plasma Discharges and Material Processing, (John Weily & Sons., New York, 1994)Google Scholar
4. Rusanov, V. D., Fridman, A., Physics of Chemically Active Plasma, (Nauka, Moscow, 1984)Google Scholar
5. Ursu, I. (et al), J. Phys. D: Appl. Phys., 18, 1693 (1985)Google Scholar
6. Ursu, I. (et al), J. Phys. D: Appl. Phys., 20, 1519 (1987)10.1088/0022-3727/20/11/025Google Scholar
7. D'Anna, E. (et al.), J. Appl. Phys., 69 (3), 1687–1696 (1991)Google Scholar
8. Anisimov, V. N. (et al.), Applied Optics, 23 (1), 18–25 (1984)10.1364/AO.23.000018Google Scholar
9. Ursu, I. (et al), Appl. Phys. A., 29, 209–212 (1982)Google Scholar
10. Thomann, A.L., Hermann, J., Boulmer-Leborgne, C., Thin Solid Films, 241, 39–43 (1994)10.1016/0040-6090(94)90392-1Google Scholar
11. Narasimhan, S.L., Copley, S.M., Stryland, E.W. Van, Bass, M., Journal of Quantum Electronics, QE–13, 2 (1977)Google Scholar
12. El-Hossary, F.M., Negm, N.Z., Khalil, S.M., Raaif, M., Thin Solid Films, 497, 196 (2006)10.1016/j.tsf.2005.09.193Google Scholar
13. Beillis, I.I., Laser and Particle Beams, 25, 53 (2007)Google Scholar