Hostname: page-component-7c8c6479df-ph5wq Total loading time: 0 Render date: 2024-03-19T02:53:00.301Z Has data issue: false hasContentIssue false

Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition

Published online by Cambridge University Press:  11 January 2012

Cagla Ozgit
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
Fatma Kayaci
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
Inci Donmez
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
Engin Cagatay
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
Tamer Uyar
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
Necmi Biyikli
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
Get access

Abstract

Al2O3 and AlN nanotubes were fabricated by depositing conformal thin films via atomic layer deposition (ALD) on electrospun nylon 66 (PA66) nanofiber templates. Depositions were carried out at 200°C, using trimethylaluminum (TMAl), water (H2O), and ammonia (NH3) as the aluminum, oxygen, and nitrogen precursors, respectively. Deposition rates of Al2O3 and AlN at this temperature were ∼1.05 and 0.86 Å/cycle. After the depositions, Al2O3- and AlN-coated nanofibers were calcinated at 500°C for 2 h in order to remove organic components. Nanotubes were characterized by using X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). AlN nanotubes were polycrystalline as determined by high resolution TEM (HR-TEM) and selected area electron diffraction (SAED). TEM images of all the samples reported in this study indicated uniform wall thicknesses.

Type
Research Article
Copyright
Copyright © Materials Research Society 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Ritala, M. and Leskelä, M., in Handbook of Thin Film Materials Vol. 1, edited by Nalwa, H. S. (Academic Press, San Diego, 2002) p.103.Google Scholar
2. Peng, Q., Sun, X.-Y., Spagnola, J.C., Hyde, G.K., Spontak, R.J. and Parsons, G.N., Nano Lett. 7 (3), 719 (2007).Google Scholar
3. Peng, Q., Sun, X.-Y., Spagnola, J.C., Saquing, C., Khan, S.A., Spontak, R.J. and Parsons, G.N., ACS Nano 3 (3) 546 (2009).Google Scholar
4. Oldham, C.J., Gong, B., Spagnola, J.C., Jur, J.S., Senecal, K.J., Godfrey, T.A. and Parsons, G.N., J. Electrochem. Soc. 158 (9), D549 (2011).Google Scholar
5. Kim, G.-M., Lee, S.-M., Michler, G.H., Roggendorf, H., Gösele, U. and Knez, M., Chem. Mater. 20, 3085 (2008).Google Scholar
6. Santala, E., Kemell, M., Leskelä, M. and Ritala, M., Nanotechnology 20, 035602 (2009).Google Scholar
7. Park, J.Y., Choi, S.-W., Lee, J.-W., Lee, C. and Kim, S.S., J. Am. Ceram. Soc. 92 (11), 2551 (2009).Google Scholar
8. Choi, S.-W., Park, J.Y. and Kim, S.S., Nanotechnology 20, 465603 (2009).Google Scholar
9. Park, J.Y., Choi, S.-W. and Kim, S.S., Nanotechnology 21, 475601 (2010).Google Scholar
10. Duez, N., Mutel, B., Dessaux, O., Goudmand, P. and Grimblot, J., Surf. Coat. Tech. 125, 79 (2000).Google Scholar
11. Manova, D., Dimitrova, V., Fukarek, W. and Karpuzov, D., Surf. Coat. Tech. 106, 205 (1998).Google Scholar
12. Rosenberger, L., Baird, R., McCullen, E., Auner, G. and Shreve, G., Surf. Interface Anal. 40, 1254 (2008).Google Scholar
13. Liao, H.M., Sodhi, R.N.S. and Coyle, T.W., J. Vac. Sci. Technol. A 11(5), 2681 (1993).Google Scholar