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Effects of the magnetic field gradient on the wall power deposition of Hall thrusters

Published online by Cambridge University Press:  23 March 2017

Yongjie Ding ,
Peng Li ,
Xu Zhang ,
Liqiu Wei ,
Hezhi Sun ,
Wuji Peng  and
Daren Yu
Yongjie Ding
Affiliation:
Harbin Institute of Technology, Harbin, People’s Republic of China
Peng Li
Affiliation:
Harbin Institute of Technology, Harbin, People’s Republic of China
Xu Zhang
Affiliation:
Harbin Institute of Technology, Harbin, People’s Republic of China
Liqiu Wei*
Affiliation:
Harbin Institute of Technology, Harbin, People’s Republic of China
Hezhi Sun
Affiliation:
Harbin Institute of Technology, Harbin, People’s Republic of China
Wuji Peng
Affiliation:
Harbin Institute of Technology, Harbin, People’s Republic of China
Daren Yu
Affiliation:
Harbin Institute of Technology, Harbin, People’s Republic of China
*
†Email addresses for correspondence: weiliqiu@hit.edu.cn, amberding@163.com
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Abstract

The effect of the magnetic field gradient in the discharge channel of a Hall thruster on the ionization of the neutral gas and power deposition on the wall is studied through adopting the 2D-3V particle-in-cell (PIC) and Monte Carlo collisions (MCC) model. The research shows that by gradually increasing the magnetic field gradient while keeping the maximum magnetic intensity at the channel exit and the anode position unchanged, the ionization region moves towards the channel exit and then a second ionization region appears near the anode region. Meanwhile, power deposition on the walls decreases initially and then increases. To avoid power deposition on the walls produced by electrons and ions which are ionized in the second ionization region, the anode position is moved towards the channel exit as the magnetic field gradient is increased; when the anode position remains at the zero magnetic field position, power deposition on the walls decreases, which can effectively reduce the temperature and thermal load of the discharge channel.

Keywords

electric dischargesplasma applicationsplasma devices
Type
Research Article
Information
Journal of Plasma Physics , Volume 83 , Issue 2 , April 2017 , 905830205
Copyright
© Cambridge University Press 2017 

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