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In Situ Hvem of Crystallization of Amorphous TiNi Thin Films

Published online by Cambridge University Press:  26 July 2012

Warren J. Moberly ,
J. D. Busch ,
A. D. Johnson  and
M. H. Berkson
Warren J. Moberly
Affiliation:
Dept. of Materials Science & Engineering, Stevens Institute of Technology, Hoboken, NJ
J. D. Busch
Affiliation:
TiNi Alloy Company, Oakland, CA
A. D. Johnson
Affiliation:
TiNi Alloy Company, Oakland, CA
M. H. Berkson
Affiliation:
Dept. of Materials Science & Engineering, University of California at Berkeley, CA.
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Abstract

TiNi alloys have been extensively studied for their shape memory properties, arising from a martensitic transformation between the cubic B2 crystal structure and the monoclinic B19′ structure. However, only recently has the application of TiNi alloys as thin film actuators been considered. Well-controlled thicknesses of TiNi films have been deposited via d.c. magnetron ion sputtering, with as-deposited films exhibiting an amorphous structure. These ductile metallic glass films may be bent into various macroscopic shapes and then heated to crystallize the B2 structure, thereby determining its parent (memory) shape. In situ high voltage electron microscopy (HVEM) heating and cooling experiments are utilized to observe the crystallization of the B2 structure and the martensitic transformation from B2 to B19∼500°C to ∼600°C. Isothermal annealing determines the kinetics of the crystallization process to be nucleation limited. The nucleation of B2 crystallites in thicker regions of TEM specimens, which occurs prior to nucleation in thinner regions, indicates that nucleation does not occur preferentially at surfaces, but rather homogeneously. After crystallization is completed, the existence of random orientations of B2 grains provides films that will exhibit shape memory in any desired orientation. Video-recording of the crystallization processes has been acquired.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 230: Symposium R – Phase Transformation Kinetics in Thin Films , 1991 , 85
Copyright
Copyright © Materials Research Society 1992

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