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Picosecond Dynamics of Laser Annealing

Published online by Cambridge University Press:  15 February 2011

Dae M. Kim ,
Rajiv R. Shah ,
D. Von Der Linde  and
D.L. Crosthwait
Dae M. Kim
Affiliation:
Department of Electrical Engineering, Rice University, Houston, TX 77001
Rajiv R. Shah
Affiliation:
Department of Electrical Engineering, Rice University, Houston, TX 77001
D. Von Der Linde
Affiliation:
Department of Electrical Engineering, Rice University, Houston, TX 77001
D.L. Crosthwait
Affiliation:
Department of Electrical Engineering, Rice University, Houston, TX 77001
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Abstract

We report simultaneous measurements of time resolved reflection and transmission of low intensity 1.06 μm, 35 ps pulses subsequent to excitation of 50 KeV, 1016 cm−2 boron implanted silicon by 0.53 μm 35 ps pulses of varying energy densities. The samples are examined by optical and scanning electron microscopy in conjunction with defect etching. These data are discussed from the point of view of both the thermal melting model and plasma model.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 4: Symposium A – Laser and Electron-Beam Interactions with Solids , 1981 , 85
Copyright
Copyright © Materials Research Society 1982

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References

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