Hostname: page-component-76fb5796d-dfsvx Total loading time: 0 Render date: 2024-04-25T07:42:34.801Z Has data issue: false hasContentIssue false

Photo-Irradiation-Induced Narrowing of Photoluminescence Spectra from Porous Silicon

Published online by Cambridge University Press:  15 February 2011

M. Okamoto
Affiliation:
Department of Electrical Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565, Japan, okamoto@daiyan.pwr.eng.osaka-u.ac.jp
T. Nagao
Affiliation:
Department of Electrical Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565, Japan, okamoto@daiyan.pwr.eng.osaka-u.ac.jp
T. Ooiwa
Affiliation:
Department of Electrical Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565, Japan, okamoto@daiyan.pwr.eng.osaka-u.ac.jp
A. Hatta
Affiliation:
Department of Electrical Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565, Japan, okamoto@daiyan.pwr.eng.osaka-u.ac.jp
T. Ilo
Affiliation:
Department of Electrical Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565, Japan, okamoto@daiyan.pwr.eng.osaka-u.ac.jp
Get access

Abstract

Porous silicon (PS) has been prepared by varying photo-irradiation time in the latter period of anodization, and spectral intensity and width of photoluminescence (PL) have been measured as well as their dependences on current density during the photo-irradiation. Significant differences in PL spectra have been found when the timing of photo-irradiation is varied during the anodization. Sufficient numbers of photo-excited holes are responsible for the formation of PS layers yielding bright and sharp PL. The narrowest FWHM obtained was 0.182eV for a PL peak energy of 1.71eV while the highest peak energy of PL with FWHM < 0.30 eV was 2.16 eV (575 nm).

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Canham, L.T., Appl. Phys. Lett. 57, 1046 (1990).Google Scholar
2.Koshida, N. and Koyama, H., Jpn. J. Appl. Phys. 30, L1221 (1991).Google Scholar
3. Mater. Res. Soc. Symp. Proc. 253, (1992); 283, (1993); 298, (1993); 358, (1995); J. Lumin. 57, (1993).Google Scholar
4.Furuta, K., Hatta, A., Ito, T. and Hiraki, A., in Advanced Luminescence Materials, edited by Lockwood, D.J., Fauchet, P.M., Koshida, N., and Brueck, S.R.J. (The Electrochemical Society, Inc., Salem, MA, 1996), p.146155.Google Scholar
5.Smith, R.L. and Collins, S.D., J. Appl. Phys. 71, R1 (1992).Google Scholar
6.Arita, Y and Sunoda, Y, J. Electrochem. Soc. 124, 285 (1977).Google Scholar
7.Asano, T., Higa, K., Aoki, S., Tonouchi, M. and Miyasato, T., Jpn. J. Appl. Phys. 31, L373 (1992).Google Scholar
8.Ito, T., Motoi, K., Arakaki, O., Hatta, A. and Hiraki, A., Jpn. J. Appl. Phys. 33, L941 (1994).Google Scholar
9.Ito, T., Furata, K., Yoneda, T., Arakaki, O., Hatta, A. and Hiraki, A., Mater. Res. Soc. Symp. Proc. 358, 477 (1992)Google Scholar
10.Okamoto, M., Nagao, T., Ooiwa, T., Hatta, A. and Ito, T., to be published.Google Scholar